⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3680710 | 0.94 | CYP17A1 (0.32) | — | |
| SCHEMBL18994332 | 0.87 | — | — | |
| SCHEMBL678282 | 0.86 | PKM (0.33) | — | |
| SCHEMBL12326325 | 0.85 | CYP17A1 (0.30) | — | |
| SCHEMBL16708436 | 0.85 | — | — | |
| SCHEMBL10203937 | 0.85 | CYP17A1 (0.30) | — | |
| SCHEMBL172055 | 0.85 | CYP17A1 (0.36) | — | |
| SCHEMBL15281488 | 0.85 | CYP17A1 (0.36) | — | |
| SCHEMBL16708432 | 0.85 | ALDH1A1 (0.33) | — | |
| SCHEMBL16708441 | 0.83 | CYP17A1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024024440-A1 | SILICONE-CONTAINING COPOLYMER, LEVELING AGENT, COATING COMPOSITION, RESIST COMPOSITION, COLOR FILTER, AND METHOD FOR PRODUCING SILICONE-CONTAINING COPOLYMER | DIC株式会社 | 2024-02-01 | — | — | WO | disclosed |
| US-20230400769-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-12-14 | — | — | US | disclosed |
| US-20230400769-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-12-14 | — | — | US | disclosed |
| US-20230185192-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-06-15 | — | — | US | disclosed |
| US-20230185192-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-06-15 | — | — | US | disclosed |
| WO-2023054126-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN-FORMING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD | 富士フイルム株式会社 | 2023-04-06 | — | — | WO | disclosed |
| CN-111372787-B | Flexographic printing plate precursor | 住友理工株式会社 | 2021-12-21 | — | — | CN | disclosed |
| WO-2020246409-A1 | FLUORORESIN, ACTIVE ENERGY RAY-CURABLE COMPOSITION, THERMOSETTING COMPOSITION, AND CURED PRODUCTS OF COMPOSITIONS | DIC株式会社 | 2020-12-10 | — | — | WO | disclosed |
| CN-111372787-A | Flexographic printing plate precursor | 住友理工株式会社 | 2020-07-03 | — | — | CN | disclosed |
| EP-2554555-B1 | METHODS FOR PRODUCING AN ADAMANTYL (METH)ACRYLATE MONOMER AND A (METH)ACRYLIC COPOLYMER THAT CONTAINS REPEATING UNITS DERIVED FROM THE MONOMER | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-09-18 | — | — | EP | disclosed |
| US-8062829-B2 | Chemically amplified resist composition and chemically amplified resist composition for immersion lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-11-22 | — | — | US | disclosed |
| US-8062829-B2 | Chemically amplified resist composition and chemically amplified resist composition for immersion lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-11-22 | — | — | US | disclosed |
| WO-2011108767-A1 | METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2011-09-09 | — | — | WO | disclosed |
| WO-2010114107-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-10-07 | — | — | WO | disclosed |
| WO-2010114158-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-10-07 | — | — | WO | disclosed |
| US-20100168464-A1 | METHOD FOR PRODUCING ADAMANTYL (METH)ACRYLATES | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2010-07-01 | — | — | US | disclosed |
| US-20090220890-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND CHEMICALLY AMPLIFIED RESIST COMPOSITION FOR IMMERSION LITHOGRAPHY | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-09-03 | — | — | US | disclosed |
| US-20090220890-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND CHEMICALLY AMPLIFIED RESIST COMPOSITION FOR IMMERSION LITHOGRAPHY | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-09-03 | — | — | US | disclosed |
| US-7078562-B2 | Adamantane derivatives and resin compositions using the same as raw material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2006-07-18 | — | — | US | disclosed |
| US-20050158662-A1 | Adamantane derivatives and resin compositions using the same as raw material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2005-07-21 | — | — | US | disclosed |