Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC1 | Q13547 | 18/20 | 0.53 |
| ▸ | HDAC3 | O15379 | 16/20 | 0.53 |
| ▸ | HDAC2 | Q92769 | 16/20 | 0.53 |
| ▸ | HDAC4 | P56524 | 14/20 | 0.53 |
| ▸ | HDAC7 | Q8WUI4 | 14/20 | 0.53 |
| ▸ | HDAC10 | Q969S8 | 14/20 | 0.53 |
| ▸ | HDAC11 | Q96DB2 | 14/20 | 0.53 |
| ▸ | HDAC8 | Q9BY41 | 14/20 | 0.53 |
| ▸ | HDAC6 | Q9UBN7 | 14/20 | 0.53 |
| ▸ | HDAC9 | Q9UKV0 | 14/20 | 0.53 |
| ▸ | HDAC5 | Q9UQL6 | 14/20 | 0.53 |
| ▸ | LTA4H | P09960 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3054699 | 0.91 | HDAC1 (0.48) | HDAC1HDAC3HDAC2HDAC4HDAC7 | |
| SCHEMBL13376962 | 0.84 | HDAC1 (0.45) | HDAC1HDAC3HDAC2HDAC4HDAC7 | |
| SCHEMBL6385721 | 0.82 | HDAC6 (0.76) | HDAC1HDAC3HDAC2HDAC4HDAC7 | |
| SCHEMBL11116592 | 0.80 | HDAC1 (0.77) | HDAC1HDAC3HDAC2HDAC4HDAC7 | |
| SCHEMBL7808014 | 0.80 | NTRK2 (0.50) | HDAC1HDAC3HDAC2HDAC4HDAC7 | |
| SCHEMBL394245 | 0.78 | FABP4 (0.59) | — | |
| SCHEMBL11118792 | 0.78 | HDAC6 (0.54) | HDAC1HDAC3HDAC2HDAC4HDAC7 | |
| Hydrochloric Acid SCHEMBL10771309 | 0.77 | HDAC6 (0.52) | HDAC1HDAC3HDAC2HDAC4HDAC7 | |
| SCHEMBL6389404 | 0.77 | HDAC6 (0.78) | HDAC1HDAC3HDAC2HDAC4HDAC7 | |
| SCHEMBL6387379 | 0.76 | HDAC1 (0.71) | HDAC1HDAC3HDAC2HDAC4HDAC7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150307818-A1 | AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES | ADVANCED TECH MATERIALS (US) | 2015-10-29 | — | — | US | claimed |
| EP-0665582-B1 | Surface treating agents and treating process for semiconductors | WAKO PURE CHEM IND LTD (JP) | 2001-03-14 | — | — | EP | claimed |
| US-5580846-A | USING A COMPLEXING AGENT; REMOVAL OF ALUMINUM FROM SURFACES | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-12-03 | — | — | US | claimed |
| EP-0665582-A2 | Surface treating agents and treating process for semiconductors | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1995-08-02 | — | — | EP | claimed |
| US-20150307818-A1 | AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES | ADVANCED TECH MATERIALS (US) | 2015-10-29 | — | — | US | disclosed |
| US-9063431-B2 | Aqueous cleaner for the removal of post-etch residues | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2015-06-23 | — | — | US | disclosed |
| EP-2593964-A2 | AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES | Advanced Technology Materials, Inc. (US) | 2013-05-22 | — | — | EP | disclosed |
| WO-2012009639-A9 | AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2012-05-24 | — | — | WO | disclosed |
| WO-2012009639-A2 | AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2012-01-19 | — | — | WO | disclosed |
| WO-2010091045-A2 | NON-FLUORIDE CONTAINING COMPOSITION FOR THE REMOVAL OF POLYMERS AND OTHER ORGANIC MATERIAL FROM A SURFACE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2010-08-12 | — | — | WO | disclosed |
| WO-2009032460-A1 | NON-FLUORIDE CONTAINING COMPOSITION FOR THE REMOVAL OF RESIDUE FROM A MICROELECTRONIC DEVICE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2009-03-12 | — | — | WO | disclosed |
| EP-0665582-B1 | Surface treating agents and treating process for semiconductors | WAKO PURE CHEM IND LTD (JP) | 2001-03-14 | — | — | EP | disclosed |
| US-5580846-A | USING A COMPLEXING AGENT; REMOVAL OF ALUMINUM FROM SURFACES | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-12-03 | — | — | US | disclosed |
| EP-0665582-A2 | Surface treating agents and treating process for semiconductors | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1995-08-02 | — | — | EP | disclosed |