Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FABP4 | P15090 | 1/20 | 0.59 |
| ▸ | CA1 | P00915 | 2/20 | 0.56 |
| ▸ | CA2 | P00918 | 2/20 | 0.56 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.55 |
| ▸ | ITGB3 | P05106 | 2/20 | 0.51 |
| ▸ | ITGA2B | P08514 | 2/20 | 0.51 |
| ▸ | SIRT5 | Q9NXA8 | 2/20 | 0.49 |
| ▸ | NME4 | O00746 | 1/20 | 0.49 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.49 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.49 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.49 |
| ▸ | AVPR2 | P30518 | 1/20 | 0.49 |
| ▸ | AGTR1 | P30556 | 1/20 | 0.49 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.49 |
| ▸ | AVPR1A | P37288 | 1/20 | 0.49 |
| ▸ | HTR3A | P46098 | 1/20 | 0.49 |
| ▸ | GCDH | Q92947 | 1/20 | 0.49 |
| ▸ | SLC29A1 | Q99808 | 1/20 | 0.49 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.49 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9717417 | 0.88 | ITGB3 (0.65) | CA1CA2MAPK1ITGB3ITGA2B | |
| SCHEMBL18409238 | 0.87 | FABP4 (0.77) | FABP4CA1CA2MAPK1POLB | |
| SCHEMBL9717434 | 0.86 | MAPK1 (0.71) | CA1CA2MAPK1SIRT5NME4 | |
| SCHEMBL3187456 | 0.86 | FABP4 (0.56) | FABP4CA1CA2MAPK1SIRT5 | |
| SCHEMBL27537533 | 0.86 | POLB (0.58) | FABP4CA1CA2MAPK1SIRT5 | |
| SCHEMBL9951399 | 0.86 | FABP4 (0.56) | FABP4CA1CA2MAPK1SIRT5 | |
| SCHEMBL24316125 | 0.85 | MAPK1 (0.76) | FABP4CA1CA2MAPK1POLB | |
| SCHEMBL24471265 | 0.83 | ALOX15 (0.52) | FABP4CA1CA2MAPK1ITGB3 | |
| Betamipron SCHEMBL605899 | 0.83 | PRSS1 (0.70) | CA1CA2MAPK1POLBSMN1; SMN2 | |
| Betamipron SCHEMBL4498475 | 0.83 | PRSS1 (0.70) | CA1CA2MAPK1POLBSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2057668-A2 | METHODS FOR SUBSTRATE SURFACE CLEANING SUITABLE FOR FABRICATING SILICON-ON-INSULATOR STRUCTURES | Applied Materials, Inc. (US) | 2009-05-13 | — | — | EP | claimed |
| US-20080268617-A1 | METHODS FOR SUBSTRATE SURFACE CLEANING SUITABLE FOR FABRICATING SILICON-ON-INSULATOR STRUCTURES | APPLIED MATERIALS, INC. | 2008-10-30 | — | — | US | claimed |
| WO-2008021747-A2 | METHODS FOR SUBSTRATE SURFACE CLEANING SUITABLE FOR FABRICATING SILICON-ON-INSULATOR STRUCTURES | APPLIED MATERIALS, INC. (US) | 2008-02-21 | — | — | WO | claimed |
| US-20050227888-A1 | Cleaning method and solution for cleaning a wafer in a single wafer process | VERHAVERBEKE STEVEN | 2005-10-13 | — | — | US | claimed |
| US-20020102852-A1 | Cleaning method and solution for cleaning a wafer in a single wafer process | APPLIED MATERIALS, INC. | 2002-08-01 | — | — | US | claimed |
| WO-2002001609-A2 | CLEANING METHOD AND SOLUTION FOR CLEANING A WAFER IN A SINGLE WAFER PROCESS | APPLIED MATERIALS, INC. (US) | 2002-01-03 | — | — | WO | claimed |
| US-20230369209-A1 | SEMICONDUCTOR DEVICE WITH MULTI-CARBON-CONCENTRATION DIELECTRICS | NANYA TECHNOLOGY CORPORATION (TW) | 2023-11-16 | — | — | US | disclosed |
| US-20230335495-A1 | SEMICONDUCTOR DEVICE WITH LINER STRUCTURE | NANYA TECHNOLOGY CORPORATION (TW) | 2023-10-19 | — | — | US | disclosed |
| US-9172076-B2 | Membranes suitable for use as separators and electrochemical cells including such separators | ETV ENERGY LTD. (IL) | 2015-10-27 | — | — | US | disclosed |
| US-8173584-B2 | Composition and method for treating semiconductor substrate surface | LASERWORT LTD (HK) | 2012-05-08 | — | — | US | disclosed |
| US-8101561-B2 | Composition and method for treating semiconductor substrate surface | LASERWORT LTD (HK) | 2012-01-24 | — | — | US | disclosed |
| US-20110118165-A1 | COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE | Lee, Wai Mun (US) | 2011-05-19 | — | — | US | disclosed |
| US-20100105595-A1 | COMPOSITION COMPRISING CHELATING AGENTS CONTAINING AMIDOXIME COMPOUNDS | EKC TECHNOLOGY, INC. | 2010-04-29 | — | — | US | disclosed |
| US-20060270242-A1 | Cleaning method and solution for cleaning a wafer in a single wafer process | VERHAVERBEKE STEVEN | 2006-11-30 | — | — | US | disclosed |
| US-20060260647-A1 | Cleaning method and solution for cleaning a wafer in a single wafer process | VERHAVERBEKE STEVEN | 2006-11-23 | — | — | US | disclosed |
| US-20060264343-A1 | Cleaning method and solution for cleaning a wafer in a single wafer process | VERHAVERBEKE STEVEN | 2006-11-23 | — | — | US | disclosed |
| US-20060054181-A1 | Cleaning method and solution for cleaning a wafer in a single wafer process | APPLIED MATERIALS, INC. | 2006-03-16 | — | — | US | disclosed |
| US-20050227888-A1 | Cleaning method and solution for cleaning a wafer in a single wafer process | VERHAVERBEKE STEVEN | 2005-10-13 | — | — | US | disclosed |
| US-6927176-B2 | Cleaning method and solution for cleaning a wafer in a single wafer process | APPLIED MATERIALS, INC. (US) | 2005-08-09 | — | — | US | disclosed |
| US-20020102852-A1 | Cleaning method and solution for cleaning a wafer in a single wafer process | APPLIED MATERIALS, INC. | 2002-08-01 | — | — | US | disclosed |