SCHEMBL36863

SCHEMBL36863

CCO[Si](C)(CS)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2241630 0.80
SCHEMBL13608445 0.80
SCHEMBL238291 0.77
SCHEMBL375282 0.77
SCHEMBL237173 0.75
SCHEMBL135560 0.73
SCHEMBL66058 0.73
SCHEMBL332696 0.73
SCHEMBL49408 0.73
SCHEMBL202455 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1316 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4735661-A1 INHERENT AREA SELECTIVE DEPOSITION OF SILICON-CONTAINING DIELECTRIC ON METAL SUBSTRATE GELEST, INC. (US) 2026-05-06 EP claimed
US-12381076-B2 Inherent area selective deposition of silicon-containing dielectric on metal substrate GELEST, INC. (US) 2025-08-05 US claimed
CN-120202247-A Silane compound and composition containing same 昕特玛私人有限公司 2025-06-24 CN claimed
US-20250095982-A1 INHERENT AREA SELECTIVE DEPOSITION OF SILICON-CONTAINING DIELECTRIC ON METAL SUBSTRATE GELEST, INC. 2025-03-20 US claimed
WO-2025053926-A1 INHERENT AREA SELECTIVE DEPOSITION OF SILICON-CONTAINING DIELECTRIC ON METAL SUBSTRATE GELEST, INC. (US) 2025-03-13 WO claimed
US-12138576-B2 Product for metal adsorption ACTIVE MINERALS INTERNATIONAL, LLC (US) 2024-11-12 US claimed
EP-4366867-A1 PRODUCT FOR METAL ADSORPTION Active Minerals International, LLC (US) 2024-05-15 EP claimed
US-20240109018-A1 PRODUCT FOR METAL ADSORPTION ACTIVE MINERALS INTERNATIONAL, LLC (US) 2024-04-04 US claimed
US-20230048090-A1 PRODUCT FOR METAL ADSORPTION ACTIVE MINERALS INTERNATIONAL, LLC (US) 2023-02-16 US claimed
WO-2023014557-A1 PRODUCT FOR METAL ADSORPTION ACTIVE MINERALS INTERNATIONAL, LLC (US) 2023-02-09 WO claimed
US-5674964-A Self-curing systems FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) 1997-10-07 US claimed
EP-0668326-A2 Covalently-nucleophilic self-curing systems FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) 1995-08-23 EP claimed
US-5415909-A Ethylene-vinyl acetate, silane coupler SEKISUI CHEMICAL CO., LTD. (JP) 1995-05-16 US claimed
WO-1994025406-A1 METHOD FOR THE FABRICATION OF TRANSPARENT DENSE GLASSES OBTAINED FROM SILICONE ALKOXYDES OR METAL ALKOXYDES BY THE SOL-GEL ROUTE, AND GLASSES OBTAINED ACCORDING TO SUCH METHOD ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) 1994-11-10 WO claimed
EP-0602644-A1 An interlayer film and laminated glass using the same SEKISUI CHEMICAL CO., LTD. (JP) 1994-06-22 EP claimed
EP-0495936-A4 METHOD FOR ENHANCING THE STRENGTH OF A GLASS CONTAINER AND STRENGTH ENHANCED GLASS CONTAINER 1993-03-17 EP claimed
EP-0495936-A1 METHOD FOR ENHANCING THE STRENGTH OF A GLASS CONTAINER AND STRENGTH ENHANCED GLASS CONTAINER ADVANCED GLASS TREATMENT SYSTEMS (US) 1992-07-29 EP claimed
WO-1991019606-A1 METHOD FOR ENHANCING THE STRENGTH OF A GLASS CONTAINER AND STRENGTH ENHANCED GLASS CONTAINER ADVANCED GLASS TREATMENT SYSTEMS (US) 1991-12-26 WO claimed
EP-0451709-A2 Silanes, process for their preparation and their use for preparing polymers and polycondensates FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) 1991-10-16 EP claimed
EP-0450624-A2 Polymerisable silicic acid heteropolycondensates and their use FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) 1991-10-09 EP claimed