Fluoride Ion

Fluoride Ion

SCHEMBL3689412

CCCCC1=C([Zr+2]C2=C(CCCC)C(C)=CC2)CC=C1C.[F-].[F-]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bromide SCHEMBL7184978 0.96
Hydrochloric Acid SCHEMBL616749 0.96
Hydrochloric Acid SCHEMBL8082447 0.89 ALOX5 (0.33)
Hydrochloric Acid SCHEMBL6628680 0.89 ALOX5 (0.33)
SCHEMBL616015 0.87 CA2 (0.32)
Trifluoromethanesulfonic Acid SCHEMBL5685000 0.82 KCNH2 (0.39)
Hydrochloric Acid SCHEMBL4980454 0.78
Hydrochloric Acid SCHEMBL4974095 0.76
Hydrochloric Acid SCHEMBL6278391 0.76
SCHEMBL15533730 0.76 BCHE (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-4523002-B2 2010-08-11 JP claimed
EP-1633790-A4 POLYMERIZATION PROCESS USING A METALLOCENE CATALYST SYSTEM UNIVATION TECH LLC (US) 2007-07-18 EP claimed
EP-1633790-A1 POLYMERIZATION PROCESS USING A METALLOCENE CATALYST SYSTEM Univation Technologies LLC (US) 2006-03-15 EP claimed
WO-2005005488-A1 POLYMERIZATION PROCESS USING A METALLOCENE CATALYST SYSTEM UNIVATION TECHNOLOGIES, LLC (US) 2005-01-20 WO claimed
EP-1633790-A4 POLYMERIZATION PROCESS USING A METALLOCENE CATALYST SYSTEM UNIVATION TECH LLC (US) 2007-07-18 EP disclosed
EP-1633790-A1 POLYMERIZATION PROCESS USING A METALLOCENE CATALYST SYSTEM Univation Technologies LLC (US) 2006-03-15 EP disclosed
WO-2005005488-A1 POLYMERIZATION PROCESS USING A METALLOCENE CATALYST SYSTEM UNIVATION TECHNOLOGIES, LLC (US) 2005-01-20 WO disclosed