SCHEMBL3690168

SCHEMBL3690168

CC(O)COC(=O)C1CC2C=CC1C2

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 10/20 0.45
HPGD P15428 1/20 0.45
KMT2A Q03164 3/20 0.44
POLB P06746 3/20 0.44
RAB9A P51151 1/20 0.44
LMNA P02545 2/20 0.44
KDM4E B2RXH2 2/20 0.44
HSD17B10 Q99714 2/20 0.43
APEX1 P27695 1/20 0.43
RECQL P46063 1/20 0.43
BLM P54132 1/20 0.43
ESR2 Q92731 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
MAPK1 P28482 2/20 0.39
MAPT P10636 1/20 0.36
MEN1 O00255 1/20 0.35
ALOX15 P16050 1/20 0.35
TSHR P16473 1/20 0.35
HTT P42858 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL948252 0.89 ALDH1A1 (0.46) ALDH1A1HPGDKMT2APOLBRAB9A
SCHEMBL25567661 0.86 ALDH1A1 (0.44) ALDH1A1HPGDKMT2APOLBRAB9A
SCHEMBL19498812 0.85 LMNA (0.47) ALDH1A1HPGDKMT2APOLBRAB9A
SCHEMBL7895172 0.85 ALDH1A1 (0.45) ALDH1A1HPGDKMT2APOLBRAB9A
SCHEMBL13744519 0.83 ALDH1A1 (0.51) ALDH1A1HPGDKMT2APOLBRAB9A
SCHEMBL22263908 0.82 ALDH1A1 (0.42) ALDH1A1HPGDKMT2APOLBRAB9A
SCHEMBL11908038 0.81 ALDH1A1 (0.43) ALDH1A1HPGDKMT2APOLBRAB9A
SCHEMBL2754654 0.80 ALDH1A1 (0.49) ALDH1A1HPGDKMT2APOLBRAB9A
SCHEMBL31178091 0.80 ALDH1A1 (0.49) ALDH1A1HPGDKMT2APOLBRAB9A
SCHEMBL2754655 0.80 ALDH1A1 (0.49) ALDH1A1HPGDKMT2APOLBRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7763412-B2 Polymer, positive resist composition and method for forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2010-07-27 US disclosed
US-20100150506-A1 POLYMER OPTICAL WAVEGUIDE FORMING MATERIAL, POLYMER OPTICAL WAVEGUIDE AND MANUFACTURING METHOD OF POLYMER OPTICAL WAVEGUIDE NEC CORPORATION (JP) 2010-06-17 US disclosed
US-20100150506-A1 POLYMER OPTICAL WAVEGUIDE FORMING MATERIAL, POLYMER OPTICAL WAVEGUIDE AND MANUFACTURING METHOD OF POLYMER OPTICAL WAVEGUIDE NEC CORPORATION (JP) 2010-06-17 US disclosed
US-20080063975-A1 Polymer, Positive Resist Composition and Method for Forming Resist Pattern TOKYO OHKA KOGYO CO., LTD (JP) 2008-03-13 US disclosed
US-6180316-B1 SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS JSR CORPORATION (JP) 2001-01-30 US disclosed
EP-0930541-A1 Radiation sensitive resin composition JSR Corporation (JP) 1999-07-21 EP disclosed