SCHEMBL3693328

SCHEMBL3693328

CCC(CO)(CO)COC(=O)CCN1CC1

nearest known ligand 0.36

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 4/20 0.36
TP53 P04637 4/20 0.35
LMNA P02545 4/20 0.33
ALDH1A1 P00352 4/20 0.33
KMT2A Q03164 3/20 0.33
MEN1 O00255 2/20 0.33
PKM P14618 1/20 0.33
TSHR P16473 1/20 0.33
MAPT P10636 1/20 0.33
CYP3A4 P08684 1/20 0.33
MAPK1 P28482 1/20 0.33
HIF1A Q16665 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL169015 0.92 PKM (0.39) SMN1; SMN2TP53LMNAALDH1A1KMT2A
SCHEMBL4839427 0.90 TP53 (0.36) SMN1; SMN2TP53LMNAALDH1A1TSHR
SCHEMBL166977 0.90 TP53 (0.40) SMN1; SMN2TP53LMNAALDH1A1TSHR
SCHEMBL19350443 0.87 PKM (0.46) SMN1; SMN2TP53LMNAALDH1A1KMT2A
SCHEMBL19203369 0.86 TP53 (0.35) SMN1; SMN2TP53LMNAALDH1A1KMT2A
SCHEMBL20017398 0.85 TP53 (0.37) SMN1; SMN2TP53LMNAALDH1A1TSHR
SCHEMBL13456054 0.84 PKM (0.38) SMN1; SMN2TP53ALDH1A1PKM
SCHEMBL30224949 0.84 ALDH1A1 (0.36) SMN1; SMN2TP53LMNAALDH1A1KMT2A
SCHEMBL536194 0.84 SMN1; SMN2 (0.39) SMN1; SMN2TP53LMNAALDH1A1KMT2A
SCHEMBL12938734 0.83 PKM (0.34) SMN1; SMN2TP53LMNAALDH1A1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6905795-B2 Mixture of lithium compound and organonitrogen polymer in aprotic solvent SAMSUNG SDI CO., LTD. (KR) 2005-06-14 US claimed
US-20030087159-A1 Mixture of lithium compound and organonitrogen polymer in aprotic solvent SAMSUNG SDI CO., LTD. (KR) 2003-05-08 US claimed
US-10131824-B2 Adhesive composition, adhesive sheet, and method for producing semiconductor device LINTEC CORPORATION (JP) 2018-11-20 US disclosed
US-9434865-B2 Adhesive composition, an adhesive sheet and a production method of a semiconductor device LINTEC CORPORATION (JP) 2016-09-06 US disclosed
US-9382455-B2 Adhesive composition, an adhesive sheet and a production method of a semiconductor device LINTEC CORPORATION (JP) 2016-07-05 US disclosed
US-20160160094-A1 Adhesive Composition, Adhesive Sheet, and Method for Producing Semiconductor Device LINTEC CORPORATION (JP) 2016-06-09 US disclosed
US-20130244401-A1 Adhesive Composition, An Adhesive Sheet and a Production Method of a Semiconductor Device LINTEC CORPORATION (JP) 2013-09-19 US disclosed
US-20130244402-A1 Adhesive Composition, An Adhesive Sheet and a Production Method of a Semiconductor Device LINTEC CORPORATION (JP) 2013-09-19 US disclosed
US-20120148837-A1 ENERGY RAY-CURABLE PRESSURE-SENSITIVE ADHESIVE COMPOSITION AND PRESSURE-SENSITIVE ADHESIVE SHEET FOR INSPECTING STAMPERS LINTEC CORPORATION (JP) 2012-06-14 US disclosed
EP-2452992-A1 ENERGY RAY-CURABLE PRESSURE-SENSITIVE ADHESIVE COMPOSITION AND PRESSURE-SENSITIVE ADHESIVE SHEET FOR INSPECTING STAMPERS LINTEC Corporation (JP) 2012-05-16 EP disclosed
WO-2007117952-A1 PRESSURE-SENSITIVE ADHESIVE FILM AND METHOD FOR MAINTAINING FLOOR SURFACES JOHNSONDIVERSEY, INC. (US) 2007-10-18 WO disclosed
EP-0530729-A1 Method for grinding back side of semiconductor wafer and pressure-sensitive adhesive tape used in said method MITSUI TOATSU CHEMICALS, Inc. (JP) 1993-03-10 EP disclosed