Known targets — ChEMBL curated mechanism
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
The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 2/20 | 0.43 |
| ▸ | CA1 | P00915 | 3/20 | 0.37 |
| ▸ | CA2 | P00918 | 3/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | CA12 | O43570 | 1/20 | 0.35 |
| ▸ | CA7 | P43166 | 1/20 | 0.35 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.35 |
| ▸ | PPARA | Q07869 | 2/20 | 0.34 |
| ▸ | FAAH | O00519 | 5/20 | 0.33 |
| ▸ | CES2 | O00748 | 3/20 | 0.33 |
| ▸ | CES1 | P23141 | 2/20 | 0.33 |
| ▸ | CA5A | P35218 | 1/20 | 0.33 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL7637283 | 0.97 | TP53 (0.41) | TP53CA1CA2ALDH1A1CA12 | |
| Sulfuric Acid SCHEMBL7635917 | 0.93 | TP53 (0.39) | TP53CA1CA2ALDH1A1CA12 | |
| Sulfuric Acid SCHEMBL10530617 | 0.93 | TP53 (0.43) | TP53CA1CA2ALDH1A1PPARA | |
| SCHEMBL22609074 | 0.92 | CA2 (0.40) | TP53CA1CA2ALDH1A1CA12 | |
| Sulfuric Acid SCHEMBL20975191 | 0.91 | ALDH1A1 (0.43) | TP53CA1CA2ALDH1A1CA12 | |
| Sulfuric Acid SCHEMBL17102623 | 0.90 | TP53 (0.40) | TP53CA1CA2ALDH1A1CA12 | |
| Bromide SCHEMBL29102634 | 0.90 | CA2 (0.39) | TP53CA1CA2ALDH1A1CA12 | |
| SCHEMBL13043123 | 0.85 | APP (0.41) | TP53CA1CA2ALDH1A1PPARA | |
| SCHEMBL27468628 | 0.85 | APP (0.41) | TP53CA1CA2ALDH1A1PPARA | |
| Trifluoromethanesulfonic Acid SCHEMBL28416043 | 0.84 | EPHX1 (0.42) | FAAHCES2CES1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2998968-A1 | COPPER-FINE-PARTICLE DISPERSION LIQUID, CONDUCTIVE-FILM FORMATION METHOD, AND CIRCUIT BOARD | Ishihara Chemical Co., Ltd. (JP) | 2016-03-23 | — | — | EP | claimed |
| US-20160029483-A1 | COPPER PARTICULATE DISPERSION, CONDUCTIVE FILM FORMING METHOD, AND CIRCUIT BOARD | ISHIHARA CHEMICAL CO., LTD. (JP) | 2016-01-28 | — | — | US | claimed |
| CN-119968229-A | Filter with electrostatic filtering function | 马蒂夫卢森堡公司 | 2025-05-09 | — | — | CN | disclosed |
| US-12205775-B2 | Process to improve coverage and electrical performance of solid electrolytic capacitors | KEMET ELECTRONICS CORPORATION (US) | 2025-01-21 | — | — | US | disclosed |
| WO-2023238500-A1 | TREATMENT AGENT FOR CARBON FIBER PRECURSOR, AND CARBON FIBER PRECURSOR | 竹本油脂株式会社 | 2023-12-14 | — | — | WO | disclosed |
| WO-2022221058-A1 | A PROCESS TO IMPROVE COVERAGE AND ELECTRICAL PERFORMANCE OF SOLID ELECTROLYTIC CAPACITORS | KEMET ELECTRONIC CORPORATION (US) | 2022-10-20 | — | — | WO | disclosed |
| US-20220223351-A1 | Process to Improve Coverage and Electrical Performance of Solid Electrolytic Capacitors | KEMET ELECTRONICS CORPORATION | 2022-07-14 | — | — | US | disclosed |
| US-20170150725-A9 | HETEROPOLYOXOMETALATES | POM PATENTVERWALTUNGS GBR (DE) | 2017-06-01 | — | — | US | disclosed |
| EP-2953956-B1 | HETEROPOLYOXOMETALATES | POM PATENTVERWALTUNGS GBR (DE) | 2016-12-28 | — | — | EP | disclosed |
| EP-2998968-A1 | COPPER-FINE-PARTICLE DISPERSION LIQUID, CONDUCTIVE-FILM FORMATION METHOD, AND CIRCUIT BOARD | Ishihara Chemical Co., Ltd. (JP) | 2016-03-23 | — | — | EP | disclosed |
| US-20160029483-A1 | COPPER PARTICULATE DISPERSION, CONDUCTIVE FILM FORMING METHOD, AND CIRCUIT BOARD | ISHIHARA CHEMICAL CO., LTD. (JP) | 2016-01-28 | — | — | US | disclosed |
| EP-1457838-A1 | Method to reduce precipitation in developers for lithographic printing plates | Fuji Photo Film B.V. (NL) | 2004-09-15 | — | — | EP | disclosed |
| EP-1455234-A1 | Method to reduce precipitation in developers for lithographic printing plates | Fuji Photo Film B.V. (NL) | 2004-09-08 | — | — | EP | disclosed |
| US-5837425-A | PRESENSITIZATION OF PLATES, SUPPORTS, MULTILAYER, EXPOSURE TO ACTINIC RADIATION OF FILMS, DEVELOPMENT OF PLATES WITH ALKALI | FUJI PHOTO FILM CO., LTD. (JP) | 1998-11-17 | — | — | US | disclosed |
| US-5580704-A | CONTAINING BASIC DYE, ORGANIC SOLVENT HAVING LOW WATER SOLUBILITY, HYDROTROPE AGENT, ANIONIC SURFACTANT; HIGH DYE DENSITY, LOW FOAMABILITY, NONPRECIPITATING, NONSTAINING | FUJI PHOTO FILM CO., LTD. (JP) | 1996-12-03 | — | — | US | disclosed |
| EP-0716347-A1 | Developer for photosensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1996-06-12 | — | — | EP | disclosed |
| EP-0516372-B1 | Concentrated dampening water composition for lithographic printing | FUJI PHOTO FILM CO LTD (JP) | 1996-04-24 | — | — | EP | disclosed |
| EP-0652489-A1 | Process for processing a photosensitive lithographic printing plate requiring no fountain solution | FUJI PHOTO FILM CO., LTD. (JP) | 1995-05-10 | — | — | EP | disclosed |
| US-5221330-A | Hydrophilic film-forming polymer, buffer, water miscible organic solvent, micelle-forming compound, water | FUJI PHOTO FILM CO., LTD. (JP) | 1993-06-22 | — | — | US | disclosed |
| EP-0516372-A1 | Concentrated dampening water composition for lithographic printing | FUJI PHOTO FILM CO., LTD. (JP) | 1992-12-02 | — | — | EP | disclosed |