SCHEMBL371475

SCHEMBL371475

CCOC(=O)C(CO)(CO)C(=O)OCC

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PKM P14618 3/20 0.52
MEN1 O00255 2/20 0.52
KMT2A Q03164 2/20 0.52
KDM4E B2RXH2 1/20 0.52
ALDH1A1 P00352 4/20 0.46
CYP4F2 P78329 3/20 0.45
CYP4A11 Q02928 3/20 0.45
LMNA P02545 2/20 0.43
HSD17B10 Q99714 1/20 0.43
ALOX15 P16050 1/20 0.42
MGAM O43451 1/20 0.42
GAA P10253 1/20 0.42
SI P14410 1/20 0.42
MGAM2 Q2M2H8 1/20 0.42
SOAT1 P35610 1/20 0.42
THRB P10828 1/20 0.41
HTT P42858 1/20 0.39
TSHR P16473 1/20 0.39
TRPA1 O75762 1/20 0.39
PIN1 Q13526 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14493769 0.93 PKM (0.47) PKMMEN1KMT2AKDM4EALDH1A1
SCHEMBL9819873 0.88 PKM (0.47) PKMMEN1KMT2AKDM4EALDH1A1
SCHEMBL13130109 0.88 PKM (0.52) PKMMEN1KMT2AKDM4EALDH1A1
SCHEMBL17718041 0.86 MEN1 (0.50) PKMMEN1KMT2AKDM4EALDH1A1
SCHEMBL371476 0.84 CYP4F2 (0.47) PKMMEN1KMT2AKDM4EALDH1A1
SCHEMBL383194 0.83 ALDH1A1 (0.50) PKMMEN1KMT2AKDM4EALDH1A1
SCHEMBL27724022 0.83 MMP8 (0.51) PKMMEN1KMT2AKDM4EALDH1A1
SCHEMBL1037901 0.83 MEN1 (0.47) PKMMEN1KMT2AKDM4EALDH1A1
SCHEMBL1244565 0.81 MEN1 (0.54) PKMMEN1KMT2AKDM4EALDH1A1
SCHEMBL13777056 0.81 PKM (0.42) PKMMEN1KMT2AKDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 507 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120118697-A Polyhydroxy demulsifier and preparation method and application thereof 长江大学 2025-06-10 CN claimed
CN-119119027-A Azetidine derivative and preparation method and application thereof 遵义医科大学 2024-12-13 CN claimed
CN-118125768-B Environment-friendly water-permeable concrete preparation process 广东中天建筑工程有限公司 2024-11-26 CN claimed
CN-118125768-A Environment-friendly water-permeable concrete preparation process 广东中天建筑工程有限公司 2024-06-04 CN claimed
CN-114395338-B Grinding adhesive tape applied to lens and preparation method thereof 苏州赛伍应用技术股份有限公司 2023-12-01 CN claimed
CN-117127401-A Processing method of aramid fireproof yarn 安徽正欣生物科技有限公司 2023-11-28 CN claimed
CN-116120201-A Improved method for synthesizing iobialcohol 重庆圣华曦药业股份有限公司 2023-05-16 CN claimed
CN-115679547-B Antibacterial non-woven fabric for preparing protective clothing 河南省安邦卫材有限公司 2023-05-09 CN claimed
CN-115679547-A Antibacterial non-woven fabric for preparing protective clothing 河南省安邦卫材有限公司 2023-02-03 CN claimed
CN-113858376-A Preparation method of high-strength environment-friendly ecological plate 湖南九富家居材料有限公司 2021-12-31 CN claimed
US-20020037980-A1 Method for producing ethylene homo- and co-polymer SAMSUNG GENERAL CHEMICALS CO., LTD. (KR) 2002-03-28 US claimed
WO-2001096412-A1 A CATALYST FOR ETHYLENE HOMO- AND COPOLYMERIZATION SAMSUNG GENERAL CHEMICALS CO. LTD. (KR) 2001-12-20 WO claimed
WO-2001092345-A1 A METHOD FOR PRODUCING ETHYLENE HOMO- AND CO-POLYMER SAMSUNG GENERAL CHEMICALS CO., LTD. (KR) 2001-12-06 WO claimed
WO-2001081432-A1 CATALYST FOR PRODUCING AN ULTRA HIGH MOLECULAR WEIGHT POLYETHYLENE AND METHOD FOR PRODUCING AN ULTRA HIGH MOLECULAR WEIGHT POLYETHYLENE USING THE SAME SAMSUNG GENERAL CHEMICALS CO., LTD. (KR) 2001-11-01 WO claimed
US-20010031694-A1 Catalyst for polymerization and co-polymerization of ethylene SAMSUNG GENERAL CHEMICALS CO., LTD. (KR) 2001-10-18 US claimed
EP-0674233-B1 Recording sheets XEROX CORP (US) 2000-05-24 EP claimed
US-5932747-A Method for preparing 1,3-dioxane compounds HUELS AKTIENGESELLSCHAFT (DE) 1999-08-03 US claimed
US-5902896-A Process for preparing bis (hydroxymethyl) compounds HUELS AKTIENGESELLSCHAFT (DE) 1999-05-11 US claimed
US-5340685-A Light-sensitive composition containing diazo resin, polyurethane resin and fluorine atom-containing copolymer surfactant FUJI PHOTO FILM CO., LTD. (JP) 1994-08-23 US claimed
US-5272035-A Photosensitive lithographic printing plate having treated aluminum support with diazonium light-sensitive layer containing polyurethane resin and phosphorous additive FUJI PHOTO FILM CO., LTD. (JP) 1993-12-21 US claimed