⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14933230 | 0.88 | SMN1; SMN2 (0.49) | — | |
| SCHEMBL722916 | 0.79 | KMT2A (0.41) | — | |
| SCHEMBL612958 | 0.79 | ADORA2A (0.45) | — | |
| SCHEMBL724135 | 0.76 | KMT2A (0.39) | — | |
| SCHEMBL16061716 | 0.76 | KMT2A (0.42) | — | |
| SCHEMBL27950274 | 0.75 | KMT2A (0.38) | — | |
| SCHEMBL301524 | 0.75 | — | — | |
| SCHEMBL13236669 | 0.74 | ALDH1A1 (0.50) | — | |
| SCHEMBL4037683 | 0.74 | ALDH1A1 (0.50) | — | |
| SCHEMBL1386657 | 0.74 | ACHE (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250228865-A1 | COMPOUNDS FOR ENHANCING READ THROUGH OF GENES CONTAINING PREMATURE TERMINATION CODONS AND METHODS FOR MAKING AND USING THE SAME | SANOFI US SERVICES INC. (US) | 2025-07-17 | — | — | US | disclosed |
| CN-117866195-A | High refractive index material | 罗门哈斯电子材料有限责任公司 | 2024-04-12 | — | — | CN | disclosed |
| CN-116783250-A | Condensation-curable silicone composition, cured product, and method for producing the cured product | 信越化学工业株式会社 | 2023-09-19 | — | — | CN | disclosed |
| CN-109725490-B | Photosensitive resin composition, dry film, cured product, semiconductor element, printed circuit board and electronic component | 太阳控股株式会社 | 2023-06-06 | — | — | CN | disclosed |
| CN-115685679-A | Curable resin composition, pattern, and image display device | 东友精细化工有限公司 | 2023-02-03 | — | — | CN | disclosed |
| CN-114316137-A | High refractive index materials | 罗门哈斯电子材料有限责任公司 | 2022-04-12 | — | — | CN | disclosed |
| EP-2781504-A1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2014-09-24 | — | — | EP | disclosed |
| EP-2781501-A1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2014-09-24 | — | — | EP | disclosed |
| CN-103576455-A | A colored photosensitive resin composition, color filter and liquid crystal display device having the same | DONGWOO FINE CHEM CO LTD | 2014-02-12 | — | — | CN | disclosed |
| EP-1804125-B1 | METHOD FOR FINE PATTERN FORMATION | AZ ELECTRONIC MATERIALS USA (US) | 2013-07-24 | — | — | EP | disclosed |
| US-7592132-B2 | Method for fine pattern formation | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-09-22 | — | — | US | disclosed |
| US-7399582-B2 | Material for forming fine pattern and method for forming fine pattern using the same | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2008-07-15 | — | — | US | disclosed |
| US-20070248770-A1 | Method for Fine Pattern Formation | MERCK PATENT GMBH (DE) | 2007-10-25 | — | — | US | disclosed |
| EP-1804125-A1 | METHOD FOR FINE PATTERN FORMATION | AZ Electronic Materials (Japan) K.K. (JP) | 2007-07-04 | — | — | EP | disclosed |
| US-20060183218-A1 | Material for forming fine pattern and method for forming fine pattern using the same | MERCK PATENT GMBH (DE) | 2006-08-17 | — | — | US | disclosed |
| EP-1653286-A1 | MATERIAL FOR FORMING FINE PATTERN AND METHOD FOR FORMING FINE PATTERN USING THE SAME | AZ Electronic Materials USA Corp. (US) | 2006-05-03 | — | — | EP | disclosed |
| US-20040048200-A1 | Method for forming fine pattern on substrate by using resist pattern, and resist surface treatment agent | RENESAS TECHNOLOGY CORP. (JP) | 2004-03-11 | — | — | US | disclosed |
| US-6602647-B2 | Photo acid generator with high transparency and excellent heat stability in a photoresist for lithography using far ultraviolet light, especially light of ArF excimer consists of a cyclic sulfonium compound with 2-oxo group | NEC CORPORATION (JP) | 2003-08-05 | — | — | US | disclosed |
| US-20020045122-A1 | Sulfonium salt compound and resist composition and pattern forming method using the same | NEC CORPORATION | 2002-04-18 | — | — | US | disclosed |
| EP-1113334-A1 | Sulfonium salt compound, resist composition comprising the same and pattern forming method using the composition | NEC CORPORATION (JP) | 2001-07-04 | — | — | EP | disclosed |