SCHEMBL3729652

SCHEMBL3729652

O=CC1(O)CC=Cc2ccccc21

nearest known ligand 0.34

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
HDAC4 P56524 1/20 0.33
THRB P10828 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
KDM4E B2RXH2 2/20 0.32
PKM P14618 1/20 0.32
LMNA P02545 1/20 0.31
TSHR P16473 1/20 0.31
MAPK1 P28482 1/20 0.31
SCN4A P35499 1/20 0.31
SCN5A Q14524 1/20 0.31
SCN9A Q15858 1/20 0.31
NOTUM Q6P988 1/20 0.30
P2RX1 P51575 1/20 0.30
P2RX3 P56373 1/20 0.30
P2RX4 Q99571 1/20 0.30
HSD11B1 P28845 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Thiosemicarbazide SCHEMBL7262899 0.87 LMNA (0.30) LMNATSHRMAPK1SCN4ASCN5A
SCHEMBL258243 0.82 KDM4E (0.32) KDM4EPKM
SCHEMBL27157044 0.78 PTPRC (0.34) LMNA
SCHEMBL500281 0.75
SCHEMBL9663013 0.75 HTR2A (0.31)
SCHEMBL461337 0.75 THRB (0.40) HDAC4THRBTDP1KDM4EPKM
Oxalic Acid SCHEMBL29053840 0.75 THRB (0.36) HDAC4THRBTDP1KDM4EPKM
SCHEMBL556904 0.75 KDM4E (0.36) HDAC4KDM4EPKM
SCHEMBL5701610 0.75 KDM4E (0.36) HDAC4KDM4EPKM
SCHEMBL27157045 0.75 TXNRD1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109081921-B Silicon-based hard mask 罗门哈斯电子材料有限责任公司 2021-07-06 CN disclosed
US-10186424-B2 Silicon-based hardmask ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-01-22 US disclosed
US-7741102-B2 Analyte detection and apparatus therefor UNIVERSITY OF STRATHCLYDE (GB) 2010-06-22 US disclosed
US-20040234958-A1 Analyte detection and apparatus therefor RENISHAW DIAGNOSTICS LIMITED (GB) 2004-11-25 US disclosed
EP-1272827-A1 ANALYTE DETECTION & APPARATUS THEREFOR UNIVERSITY OF STRATHCLYDE (GB) 2003-01-08 EP disclosed
WO-2001077650-A1 ANALYTE DETECTION & APPARATUS THEREFOR UNIVERSITY OF STRATHCLYDE (GB) 2001-10-18 WO disclosed
US-6156853-A Deposit suppressant composition for a polmerization reactor and a method of polymerizing vinyl monomers with use of said deposit suppressant composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2000-12-05 US disclosed
US-5750577-A TETRAMERIC CALIXARENE FOR PROPHYLAXIS AGAINST CELL INFECTION BY ENVELOPED VIRUS; SIDE EFFECT REDUCTION, NON DRUG-RESISTANT SEABRIGHT CORPORATION LIMITED (CA) 1998-05-12 US disclosed
EP-0545365-B1 A method of polymerizing vinyl monomers with use of a deposit suppressant composition for the internal surfaces of a polymerization reactor SUMITOMO CHEMICAL CO (JP) 1997-05-07 EP disclosed
EP-0508442-B1 A deposit suppressant composition for the internal surfaces of a polymerization reactor and a method of polymerizing vinyl monomers with use of said deposit suppressant composition SUMITOMO CHEMICAL CO (JP) 1995-04-12 EP disclosed
EP-0497187-B1 A scale-preventing composition for a polymerization reactor and method for polymerizing vinyl monomers with its help SUMITOMO CHEMICAL CO (JP) 1995-04-05 EP disclosed
US-5321104-A Deposit suppressant composition for the internal surfaces of a polymerization reactor and a method of polymerizing vinyl monomers with use of said deposit suppressant composition SUMITOMO CHEMICAL CO., LTD. (JP) 1994-06-14 US disclosed
US-5284925-A Method of polymerizing vinyl monomers with use of a deposit suppressant composition for the internal surfaces of a polymerization reactor SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1994-02-08 US disclosed
EP-0545365-A2 A method of polymerizing vinyl monomers with use of a deposit suppressant composition for the internal surfaces of a polymerization reactor SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1993-06-09 EP disclosed
EP-0508442-A1 A deposit suppressant composition for the internal surfaces of a polymerization reactor and a method of polymerizing vinyl monomers with use of said deposit suppressant composition SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1992-10-14 EP disclosed
EP-0497187-A1 A scale-preventing composition for a polymerization reactor and method for polymerizing vinyl monomers with its help SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1992-08-05 EP disclosed
EP-0471702-A1 WATER-SOLUBLE REACTIVE DYES FOR FIBRES, THEIR PREPARATION AND USE. HOECHST AG (DE) 1992-02-26 EP disclosed
US-4384094-A CHEMICAL INTERMEDIATES TO STABLE COLORED PYRYLIUM SALTS ARMSTRONG WORLD INDUSTRIES, INC. (US) 1983-05-17 US disclosed