SCHEMBL3729797

SCHEMBL3729797

Clc1c(Cl)c(Cl)c(-c2cc(Nc3cc(-c4c(Cl)c(Cl)c(Cl)c(Cl)c4Cl)c(-c4c(Cl)c(Cl)c(Cl)c(Cl)c4Cl)c(-c4c(Cl)c(Cl)c(Cl)c(Cl)c4Cl)c3)cc(-c3c(Cl)c(Cl)c(Cl)c(Cl)c3Cl)c2-c2c(Cl)c(Cl)c(Cl)c(Cl)c2Cl)c(Cl)c1Cl

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
RAPGEF4 Q8WZA2 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3737385 0.77 RAPGEF4 (0.39) RAPGEF4
SCHEMBL1899123 0.72 HSD17B10 (0.43)
SCHEMBL11320008 0.69 CYP3A4 (0.53)
SCHEMBL1686395 0.66 TSHR (0.57) RAPGEF4
SCHEMBL11304580 0.65 NR1H2 (0.35)
SCHEMBL3735623 0.65
SCHEMBL1686399 0.64 RAPGEF4 (0.56) RAPGEF4
SCHEMBL630082 0.63 ALDH1A1 (0.44)
Perchlorobenzene SCHEMBL28699280 0.63 ALDH1A1 (0.44)
SCHEMBL4448471 0.60 CYP3A4 (0.67)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100280197-A1 MODIFIED PARTICLE, SUPPORT, CATALYST COMPONENT FOR ADDITION POLYMERIZATION, CATALYST FOR ADDITION POLYMERIZATION, AND PROCESS FOR PRODUCING ADDITION POLYMER TAKAOKI KAZUO 2010-11-04 US disclosed
US-20030069127-A1 Modified particle,support, catalyst component for addition polymerization, catalyst for addition polymerization, and process for producing addition polymer SUMITOMO CHEMICAL COMPANY, LIMTED (JP) 2003-04-10 US disclosed
EP-1275662-A1 MODIFIED PARTICLE, SUPPORT, CATALYST COMPONENT FOR ADDITION POLYMERIZATION, CATALYST FOR ADDITION POLYMERIZATION, AND PROCESS FOR PRODUCING ADDITION POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-01-15 EP disclosed