SCHEMBL3739348

SCHEMBL3739348

CC1CCCN1NCCN

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24465005 0.77
SCHEMBL1306068 0.76 CXCR4 (0.34)
SCHEMBL10023027 0.69
SCHEMBL24733071 0.69
SCHEMBL23182956 0.67
SCHEMBL11450828 0.67 ALDH1A1 (0.39)
SCHEMBL2270767 0.67 KMT2A (0.33)
SCHEMBL6017514 0.66
SCHEMBL4907901 0.66 MGLL (0.31)
SCHEMBL1646286 0.64 ACHE (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8506683-B2 Absorbent liquid, and apparatus and method for removing CO2 or H2S from gas with use of absorbent liquid MITSUBISHI HEAVY INDUSTRIES, LTD. (JP) 2013-08-13 US disclosed
US-8231719-B2 Absorbent liquid, and apparatus and method for removing CO2 or H2S from gas with use of absorbent liquid MITSUBISHI HEAVY INDUSTRIES, LTD. (JP) 2012-07-31 US disclosed
US-20100282081-A1 ABSORBENT LIQUID, AND APPARATUS AND METHOD FOR REMOVING C02 OR H2S FROM GAS WITH USE OF ABSORBENT LIQUID YOSHIYAMA RYUJI 2010-11-11 US disclosed
US-20090277330-A1 Absorbent Liquid, and Apparatus and Method for Removing CO2 or H2S from Gas with Use of Absorbent Liquid MITSUBISHI HEAVY INDUSTRIES, LTD. (JP) 2009-11-12 US disclosed
EP-2036602-A1 ABSORBENT LIQUID, AND APPARATUS AND METHOD FOR REMOVING CO2 OR H2S FROM GAS WITH USE OF ABSORBENT LIQUID Mitsubishi Heavy Industries, Ltd. (JP) 2009-03-18 EP disclosed