SCHEMBL3742673

SCHEMBL3742673

CCCCC[n+]1cc[nH]c1C

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTT P42858 5/20 0.42
KMT2A Q03164 5/20 0.39
MEN1 O00255 4/20 0.39
MAPT P10636 2/20 0.39
TP53 P04637 1/20 0.39
CYP1A2 P05177 1/20 0.39
CYP2D6 P10635 1/20 0.39
CYP2C9 P11712 1/20 0.39
CYP2C19 P33261 1/20 0.39
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
SMN1; SMN2 Q16637 5/20 0.39
LMNA P02545 3/20 0.39
KDM4E B2RXH2 3/20 0.39
NPC1 O15118 3/20 0.39
RAB9A P51151 3/20 0.39
RAD52 P43351 3/20 0.39
HSP90AA1 P07900 2/20 0.39
MAPK1 P28482 2/20 0.39
RGS12 O14924 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5090775 0.98 HTT (0.46) HTTKMT2AMEN1MAPTTP53
SCHEMBL9935730 0.98 HTT (0.46) HTTKMT2AMEN1MAPTTP53
SCHEMBL5086772 0.98 HTT (0.46) HTTKMT2AMEN1MAPTTP53
Hydrochloric Acid SCHEMBL4377339 0.98 HTT (0.41) HTTKMT2AMEN1MAPTTP53
SCHEMBL9902243 0.98 HTT (0.46) HTTKMT2AMEN1MAPTTP53
Iodide SCHEMBL6010405 0.98 HTT (0.41) HTTKMT2AMEN1MAPTTP53
SCHEMBL2328683 0.98 HTT (0.46) HTTKMT2AMEN1MAPTTP53
SCHEMBL363480 0.98 HTT (0.46) HTTKMT2AMEN1MAPTTP53
SCHEMBL1137199 0.98 HTT (0.46) HTTKMT2AMEN1MAPTTP53
SCHEMBL5287538 0.98 HTT (0.46) HTTKMT2AMEN1MAPTTP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111836849-B Process for producing fibers, films and moldings of polybenzazole polymer (P) 巴斯夫欧洲公司 2023-04-07 CN claimed
EP-3512905-B1 METHOD FOR PRODUCING A POLYBENZAZOL POLYMER (P) BASF SE (DE) 2022-08-24 EP claimed
CN-109790292-B Process for preparing polybenzazole polymer (P) 巴斯夫欧洲公司 2022-05-31 CN claimed
EP-3762447-A1 METHOD FOR PRODUCING FIBRES, FILMS AND MOULDED BODIES OF A POLYBENZAZOLE POLYMER (P) BASF SE (DE) 2021-01-13 EP claimed
US-20200407508-A1 METHOD FOR PRODUCING FIBERS, FILMS AND MOLDINGS OF A POLYBENZAZOLE POLYMER (P) BASF SE (DE) 2020-12-31 US claimed
CN-111836849-A Process for producing fibers, films and moldings of polybenzazole polymer (P) 巴斯夫欧洲公司 2020-10-27 CN claimed
WO-2019170529-A1 METHOD FOR PRODUCING FIBRES, FILMS AND MOULDED BODIES OF A POLYBENZAZOLE POLYMER (P) BASF SE (DE) 2019-09-12 WO claimed
EP-3512905-A1 METHOD FOR PRODUCING A POLYBENZAZOL POLYMER (P) BASF SE (DE) 2019-07-24 EP claimed
WO-2018050489-A1 METHOD FOR PRODUCING A POLYBENZAZOL POLYMER (P) BASF SE (DE) 2018-03-22 WO claimed
US-20250346735-A1 POLYSILOXANE COMPOSITION MERCK PATENT GMBH (DE) 2025-11-13 US disclosed
US-20250291246-A1 POLYSILOXANE COMPOSITION MERCK ELECTRONICS KGAA (DE) 2025-09-18 US disclosed
US-20250123567-A1 POLYSILOXANE COMPOSITION MERCK ELECTRONICS KGAA (DE) 2025-04-17 US disclosed
CN-119255857-A Low viscosity metal ion containing liquids 切弗朗菲利浦化学公司 2025-01-03 CN disclosed
US-20240287256-A1 POLYSILOXANE COMPOSITION MERCK PATENT GMBH (DE) 2024-08-29 US disclosed
US-8299270-B2 Clay modified electrolyte for a dye-sensitized solar cell THE YOKOHAMA RUBBER CO., LTD. (JP) 2012-10-30 US disclosed
US-20100275979-A1 CLAY MODIFIED ELECTROLYTE FOR A DYE-SENSITIZED SOLAR CELL THE YOKOHAMA RUBBER CO., LTD. (JP) 2010-11-04 US disclosed
WO-2009131692-A1 SUBSTRATES FOR DELIVERY OF PHYSIOLOGICALLY ACTIVE AGENTS THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ALABAMA (US) 2009-10-29 WO disclosed
WO-2009102419-A2 ALUMINUM RECOVERY PROCESS THE UNIVERSITY OF ALABAMA (US) 2009-08-20 WO disclosed
WO-2008020643-A1 CLAY MODIFIED ELECTOLYTE FOR A DYE-SENSITIZED SOLAR CELL THE YOKOHAMA RUBBER CO., LTD. (JP) 2008-02-21 WO disclosed
WO-2002012171-A1 METHOD FOR PREPARING CHIRAL COMPOUND BY ASYMMETRIC RING OPENING REACTIONS OF EPOXIDES KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2002-02-14 WO disclosed