SCHEMBL3744355

SCHEMBL3744355

C=C(C)C(=O)OCCCC(=O)OC1C2CC3C1OC(=O)C3C2C(=O)OC

nearest known ligand 0.32

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.32
POLB P06746 1/20 0.31
APEX1 P27695 1/20 0.31
HTT P42858 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
OPRM1 P35372 1/20 0.30
OPRK1 P41145 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL92252 0.94 ALDH1A1 (0.30) HTTOPRK1
SCHEMBL12130170 0.91 POLB (0.33) TSHRPOLBAPEX1HTTTDP1
SCHEMBL1348017 0.91 POLB (0.31) POLBAPEX1HTTTDP1
SCHEMBL12130185 0.88 POLB (0.35) TSHRPOLBAPEX1HTTTDP1
SCHEMBL92254 0.88 ALDH1A1 (0.33) HTTOPRM1OPRK1
SCHEMBL19215192 0.88 ALDH1A1 (0.33) HTTOPRM1OPRK1
SCHEMBL19062657 0.87 HTT (0.34) TSHRPOLBAPEX1HTTTDP1
SCHEMBL14488894 0.87 TSHR (0.33) TSHRPOLBAPEX1HTTTDP1
SCHEMBL3749158 0.86 TSHR (0.33) TSHROPRM1OPRK1
SCHEMBL13042772 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9152042-B2 Acrylic ester derivative, high-molecular compound and photoresist composition KURARAY CO., LTD. (JP) 2015-10-06 US disclosed
EP-2100887-B1 Lactone-containing compound, polymer, resist composition, and patterning process SHINETSU CHEMICAL CO (JP) 2013-07-03 EP disclosed
EP-2100887-B1 Lactone-containing compound, polymer, resist composition, and patterning process SHINETSU CHEMICAL CO (JP) 2013-07-03 EP disclosed
US-20130164675-A1 ACRYLIC ESTER DERIVATIVE, HIGH-MOLECULAR COMPOUND AND PHOTORESIST COMPOSITION KURARAY CO., LTD. (JP) 2013-06-27 US disclosed
US-7833694-B2 Lactone-containing compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-16 US disclosed
US-7833694-B2 Lactone-containing compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-16 US disclosed
US-7833694-B2 Lactone-containing compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-16 US disclosed
US-20090233242-A1 LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-09-17 US disclosed
US-20090233242-A1 LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-09-17 US disclosed
US-20090233242-A1 LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-09-17 US disclosed
EP-2100887-A1 Lactone-containing compound, polymer, resist composition, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2009-09-16 EP disclosed
EP-2100887-A1 Lactone-containing compound, polymer, resist composition, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2009-09-16 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090233242-A1 LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS WDR5, RER1, H1-5 TSHR 819/4885POLB 2339/4885APEX1 2214/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.