SCHEMBL3749026

SCHEMBL3749026

CC(=O)O[Si](C)(CCCNCCN)OC(C)=O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PAOX Q6QHF9 4/20 0.41
CA12 O43570 4/20 0.38
CA6 P23280 4/20 0.38
CA7 P43166 4/20 0.38
CA9 Q16790 4/20 0.38
CA14 Q9ULX7 4/20 0.38
CA5B Q9Y2D0 4/20 0.38
CA2 P00918 3/20 0.38
CA4 P22748 3/20 0.38
CA5A P35218 3/20 0.38
CA3 P07451 2/20 0.38
MEN1 O00255 2/20 0.36
RECQL P46063 2/20 0.36
KMT2A Q03164 2/20 0.36
ALDH1A1 P00352 2/20 0.35
LMNA P02545 2/20 0.34
TDP1 Q9NUW8 2/20 0.34
ALOX15 P16050 2/20 0.34
CA1 P00915 1/20 0.34
TP53 P04637 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4310067 0.84 PAOX (0.42) PAOXCA12CA6CA7CA9
SCHEMBL7633540 0.83 PAOX (0.42) PAOXKMT2ALMNAKDM4EMAPK1
SCHEMBL6698492 0.79 PAOX (0.44) PAOXCA12CA6CA7CA9
Acetic Acid SCHEMBL9850947 0.79 PAOX (0.39) PAOXCA12CA6CA7CA9
SCHEMBL6701020 0.78 PAOX (0.35) PAOX
SCHEMBL7640833 0.78 ALDH1A1 (0.35) PAOXMEN1KMT2AALDH1A1LMNA
Acetic Acid SCHEMBL15453590 0.78 PAOX (0.38) PAOXCA12CA6CA7CA9
SCHEMBL706117 0.78 KDM4E (0.35) ALDH1A1LMNATDP1KDM4EMAPK1
SCHEMBL703249 0.78 KDM4E (0.35) ALDH1A1LMNATDP1KDM4EMAPK1
SCHEMBL8677552 0.76 PAOX (0.50) PAOXCA12CA6CA7CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9760006-B2 Silicon-containing resist underlayer film forming composition having urea group NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-09-12 US disclosed
US-20100291487-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING UREA GROUP NISSAN CHEMICAL INDUSTRIES LTD. (JP) 2010-11-18 US disclosed
US-6399212-B1 COATINGS WITH ORGANOSILICON COMPOUNDS AND SOLUTION OF SILICOFLUORIC ACID AND SILICON DIOXIDE NIPPON SHEET GLASS CO., LTD. (JP) 2002-06-04 US disclosed
CN-1293216-A Polyolefinic resin for coating silicon dioxide and its preparation method NIPPON SHEET GLASS CO LTD (JP) 2001-05-02 CN disclosed
EP-1094090-A2 Silicon dioxide-coated polyolefin resin and process for its production NIPPON SHEET GLASS CO. LTD. (JP) 2001-04-25 EP disclosed