SCHEMBL6701020

SCHEMBL6701020

CC(=O)O[Si](C)(CCN)OC(C)=O

nearest known ligand 0.35

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
PAOX Q6QHF9 3/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7633540 0.86 PAOX (0.42) PAOX
SCHEMBL703725 0.85 ALDH1A1 (0.35)
SCHEMBL27710234 0.81
SCHEMBL706117 0.80 KDM4E (0.35)
SCHEMBL703249 0.80 KDM4E (0.35)
SCHEMBL5385424 0.80 ALDH1A1 (0.32)
SCHEMBL3749026 0.78 PAOX (0.41) PAOX
SCHEMBL13089420 0.78 ALDH1A1 (0.31)
SCHEMBL5359673 0.78 ALDH1A1 (0.36) PAOX
SCHEMBL6390821 0.78 PAOX (0.37) PAOX

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101646718-B Curable resin composition, protective film, and method for forming protective film JSR CORP JP 2013-04-03 CN disclosed
CN-101646718-A The formation method of curable resin composition, protective membrane and protective membrane JSR CORP JP 2010-02-10 CN disclosed
CN-101324755-A Radiation sensitive resin composition, interlayer dielectric and microlens, and method for producing thereof JSR CORP (JP) 2008-12-17 CN disclosed
CN-101226329-A Radiation sensitive resin composition, laminated insulating film, micro lens and preparation method thereof JSR CORP (JP) 2008-07-23 CN disclosed
US-20040197484-A1 Coating liquid for forming insulating film and method for producing insulating film SUMITOMO CHEMICAL COMPANY, LIMITED 2004-10-07 US disclosed