Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.48 |
| ▸ | THRB | P10828 | 1/20 | 0.46 |
| ▸ | ACLY | P53396 | 2/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2439706 | 0.98 | ALDH1A1 (0.50) | ALDH1A1L3MBTL1THRBACLY | |
| SCHEMBL3748389 | 0.93 | THRB (0.50) | ALDH1A1L3MBTL1THRBACLY | |
| SCHEMBL2438984 | 0.91 | THRB (0.52) | ALDH1A1L3MBTL1THRBACLY | |
| SCHEMBL28287540 | 0.83 | THRB (0.68) | ALDH1A1L3MBTL1THRB | |
| SCHEMBL27224348 | 0.83 | THRB (0.68) | ALDH1A1L3MBTL1THRB | |
| SCHEMBL22322505 | 0.83 | THRB (0.68) | ALDH1A1L3MBTL1THRB | |
| SCHEMBL10892306 | 0.82 | ALDH1A1 (0.55) | ALDH1A1L3MBTL1THRBACLY | |
| SCHEMBL16505927 | 0.81 | THRB (0.65) | ALDH1A1L3MBTL1THRB | |
| SCHEMBL3745426 | 0.79 | ALDH1A1 (0.41) | ALDH1A1L3MBTL1 | |
| SCHEMBL8523502 | 0.79 | ALDH1A1 (0.41) | ALDH1A1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7833693-B2 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | AZ ELECTRONIC MATERIALS USA CORP. | 2010-11-16 | — | — | US | disclosed |
| US-7521170-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-04-21 | — | — | US | disclosed |
| US-20090087782-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2009-04-02 | — | — | US | disclosed |
| CN-101218225-A | Photoactive compounds | AZ ELECTRONIC MATERIALS USA (US) | 2008-07-09 | — | — | CN | disclosed |
| EP-1915360-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2008-04-30 | — | — | EP | disclosed |
| WO-2007007175-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIAL USA CORP. (DE) | 2007-01-18 | — | — | WO | disclosed |
| US-20070015084-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2007-01-18 | — | — | US | disclosed |