Indene

Indene

SCHEMBL3752830

C1=Cc2ccccc2C1.C=Cc1ccc(Cl)cc1.Clc1ccc2c3c(cccc13)C=C2.Oc1ccc2c3c(cccc13)C=C2

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Indene SCHEMBL3761122 0.89 CYP2D6 (0.31)
SCHEMBL3754760 0.88 MEN1 (0.36)
Indene SCHEMBL3764886 0.88 MAPT (0.34)
SCHEMBL3754651 0.84 MEN1 (0.38)
4-Vinylphenol SCHEMBL3761803 0.81 MAPT (0.34)
Indene SCHEMBL14637127 0.80 CA1 (0.38)
Indene SCHEMBL1972484 0.77 MAPT (0.35)
SCHEMBL3754754 0.74 MAPT (0.47)
Indene SCHEMBL2189427 0.72 CYP2D6 (0.32)
Indene SCHEMBL3141069 0.72 CYP2D6 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8361692-B2 Negative resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-01-29 US disclosed
US-20100304301-A1 Negative resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-12-02 US disclosed