SCHEMBL3754760

SCHEMBL3754760

C=Cc1ccc(Cl)cc1.Clc1ccc2c3c(cccc13)C=C2.Oc1ccc2c3c(cccc13)C=C2

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
NPC1 O15118 1/20 0.36
USP2 O75604 1/20 0.36
RAB9A P51151 1/20 0.36
ATM Q13315 1/20 0.36
KEAP1 Q14145 1/20 0.36
NFE2L2 Q16236 1/20 0.36
MAPT P10636 2/20 0.34
APP P05067 1/20 0.34
THRB P10828 1/20 0.34
HPGD P15428 1/20 0.34
ALOX15 P16050 1/20 0.34
TSHR P16473 1/20 0.34
CASP1 P29466 1/20 0.34
SNCA P37840 1/20 0.34
RECQL P46063 1/20 0.34
HSD17B10 Q99714 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
KDM4E B2RXH2 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3754651 0.95 MEN1 (0.38) MEN1KMT2ANPC1USP2RAB9A
4-Vinylphenol SCHEMBL3761803 0.92 MAPT (0.34) MEN1KMT2AMAPTAPPTHRB
Indene SCHEMBL3752830 0.88
SCHEMBL3754754 0.84 MAPT (0.47) MEN1KMT2ANPC1USP2RAB9A
4-Vinylphenol SCHEMBL3759703 0.82 MEN1 (0.35) MEN1KMT2AABCG2
SCHEMBL3757442 0.79 MAPT (0.41) MEN1KMT2ANPC1USP2RAB9A
Indene SCHEMBL3761122 0.75 CYP2D6 (0.31)
SCHEMBL119729 0.74 RECQL (0.58) MEN1KMT2ANPC1USP2RAB9A
SCHEMBL3408215 0.74 CYP1A2 (0.48) MEN1KMT2AATMMAPTHPGD
4-Vinylphenol SCHEMBL2193194 0.73 MAOB (0.36) MEN1KMT2ANPC1RAB9AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8361692-B2 Negative resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-01-29 US disclosed
US-20100304301-A1 Negative resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-12-02 US disclosed