SCHEMBL3755892

SCHEMBL3755892

Clc1ccc2c(c1)CC=C2.Oc1ccc2c(c1)CC=C2

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.38
ESR2 Q92731 2/20 0.38
TSHR P16473 3/20 0.38
CXCR2 P25025 1/20 0.35
HSD17B10 Q99714 3/20 0.34
CYP3A4 P08684 2/20 0.34
MEN1 O00255 2/20 0.34
MAPT P10636 2/20 0.34
HTT P42858 2/20 0.34
KMT2A Q03164 2/20 0.34
SLC22A1 O15245 1/20 0.34
USP2 O75604 1/20 0.34
LMNA P02545 1/20 0.34
HSP90AA1 P07900 1/20 0.34
HSPD1 P10809 1/20 0.34
HSPA5 P11021 1/20 0.34
IDO1 P14902 1/20 0.34
HPGD P15428 1/20 0.34
ALOX15 P16050 1/20 0.34
ALOX12 P18054 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1896564 0.90 HTR2C (0.38) TSHRCYP3A4MEN1MAPTHTT
SCHEMBL31513977 0.90 HTR2C (0.38) TSHRCYP3A4MEN1MAPTHTT
SCHEMBL29634416 0.90 DRD2 (0.36) ESR1ESR2HSD17B10MAOBMAOA
SCHEMBL217518 0.90 DRD2 (0.36) ESR1ESR2HSD17B10MAOBMAOA
SCHEMBL9995642 0.77 DRD2 (0.35) ESR1ESR2TSHRHSD17B10CYP3A4
SCHEMBL28861019 0.76 ESR1 (0.43) ESR1ESR2MEN1KMT2A
SCHEMBL1786889 0.74 HTR2C (0.38) TSHRCYP3A4MEN1MAPTHTT
SCHEMBL275808 0.74 PBRM1 (0.36) ESR1ESR2HSD17B10CYP3A4DRD2
SCHEMBL28236772 0.72 PBRM1 (0.35) ESR1ESR2CYP3A4DRD2DRD4
SCHEMBL6832591 0.71 HTR2A (0.35) CYP3A4HTTLMNASRD5A1HTR2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8361692-B2 Negative resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-01-29 US disclosed
US-20100304301-A1 Negative resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-12-02 US disclosed