SCHEMBL3757859

SCHEMBL3757859

Cc1cccc(C)c1OP(=O)(Cl)Cl

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.42
LMNA P02545 3/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
GAA P10253 1/20 0.40
HPGD P15428 2/20 0.36
KDM4E B2RXH2 1/20 0.36
ALDH1A1 P00352 1/20 0.36
HSD17B10 Q99714 1/20 0.36
SCN4A P35499 4/20 0.35
CYP1A2 P05177 3/20 0.35
CYP3A4 P08684 2/20 0.35
SCN1A P35498 2/20 0.35
SCN5A Q14524 2/20 0.35
SCN9A Q15858 2/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C9 P11712 1/20 0.35
TSHR P16473 1/20 0.35
NFKB1 P19838 1/20 0.35
KCNK3 O14649 1/20 0.35
CACNA1F O60840 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30772416 0.94 MAPT (0.39) MAPTLMNASMN1; SMN2GAAHPGD
SCHEMBL1486673 0.86 MAPT (0.42) MAPTLMNASMN1; SMN2GAAHPGD
SCHEMBL14672621 0.83 INPPL1 (0.41) MAPTLMNASMN1; SMN2GAAHPGD
SCHEMBL940949 0.81 MAPT (0.45) MAPTLMNASMN1; SMN2GAAHPGD
SCHEMBL14204629 0.79 LMNA (0.44) MAPTLMNASMN1; SMN2GAAHPGD
SCHEMBL4990431 0.78 MAPT (0.40) MAPTLMNASMN1; SMN2GAAHPGD
SCHEMBL3757863 0.78 MAPT (0.40) MAPTLMNASMN1; SMN2GAAHPGD
SCHEMBL28397604 0.77 MAPT (0.42) MAPTLMNASMN1; SMN2GAAHPGD
SCHEMBL5850652 0.77 MAPT (0.38) MAPTLMNASMN1; SMN2GAAHPGD
SCHEMBL272850 0.77 INPPL1 (0.43) MAPTLMNASMN1; SMN2GAAHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119948040-A Phosphorus-containing polycyclic aromatic hydroxyl compound, curable resin composition containing same, and method for producing same 日铁化学材料株式会社 2025-05-06 CN disclosed
WO-2025009607-A1 PHOSPHORIC ACID ESTER CONTAINING UNSATURATED GROUP, THERMOSETTING RESIN COMPOSITION CONTAINING SAME, AND RESIN MATERIAL 大八化学工業株式会社 2025-01-09 WO disclosed
WO-2024181111-A1 PHOSPHORUS-CONTAINING (METH)ACRYLOYL COMPOUND, PHOSPHORUS-CONTAINING VINYL BENZYL COMPOUND, PRODUCTION METHODS THEREFOR, AND FLAME-RETARDANT RESIN COMPOSITION AND LAMINATED BOARD FOR ELECTRONIC CIRCUIT BOARD CONTAINING SAME 日鉄ケミカル&マテリアル株式会社 2024-09-06 WO disclosed
WO-2024171871-A1 PHOSPHORUS-CONTAINING (METH)ACRYLOYL COMPOUND, PHOSPHORUS-CONTAINING VINYL BENZYL COMPOUND, PRODUCTION METHODS THEREFOR, FLAME-RETARDANT RESIN COMPOSITION AND LAMINATED BOARD FOR ELECTRONIC CIRCUIT BOARD CONTAINING SAME 日鉄ケミカル&マテリアル株式会社 2024-08-22 WO disclosed
CN-117999319-A Halogen-free flame-retardant curable resin composition, prepreg, metal-clad laminate, and printed wiring board 日铁化学材料株式会社 2024-05-07 CN disclosed
WO-2024071101-A1 PHOSPHORUS-CONTAINING POLYCYCLIC AROMATIC HYDROXY COMPOUND, CURABLE RESIN COMPOSITION CONTAINING SAME, AND METHOD FOR PRODUCING SAID PHOSPHORUS-CONTAINING POLYCYCLIC AROMATIC HYDROXY COMPOUND 日鉄ケミカル&マテリアル株式会社 2024-04-04 WO disclosed
WO-2024070886-A1 PHOSPHORUS-CONTAINING PHENOL COMPOUND, CURABLE RESIN COMPOSITION CONTAINING SAID PHOSPHORUS-CONTAINING PHENOL COMPOUND, CURED PRODUCT, AND METHOD FOR PRODUCING SAID PHOSPHORUS-CONTAINING PHENOL COMPOUND 日鉄ケミカル&マテリアル株式会社 2024-04-04 WO disclosed
CN-117143147-A Method for efficiently synthesizing resorcinol bis [ di (2, 6-dimethylphenyl) phosphate ] 浙江万盛股份有限公司 2023-12-01 CN disclosed
CN-117024658-A Phospholipid terminal functionalized rare earth isoprene rubber and preparation method and application thereof 海南天然橡胶产业集团股份有限公司 2023-11-10 CN disclosed
WO-2023053782-A1 HALOGEN-FREE FLAME-RETARDANT CURABLE RESIN COMPOSITION, PREPREG, METAL-CLAD LAMINATED BOARD, AND PRINTED WIRING BOARD 日鉄ケミカル&マテリアル株式会社 2023-04-06 WO disclosed
CN-113912643-A Phosphorus-containing vinylbenzyl ether compound, process for producing the same, flame-retardant resin composition, and laminate for electronic circuit board 日铁化学材料株式会社 2022-01-11 CN disclosed
CN-113912642-A Phosphorus-containing (meth) acryloyl compound, method for producing same, flame-retardant resin composition, and laminate for electronic circuit board 日铁化学材料株式会社 2022-01-11 CN disclosed
US-20100298506-A1 METHOD FOR PRODUCING AN AMINO GROUP-CONTAINING PHOSPHATE COMPOUND, AND A FLAME-RETARDANT RESIN AND FLAME-RETARDANT RESIN COMPOSITION SHOWA HIGHPOLYMER CO., LTD. (JP) 2010-11-25 US disclosed
EP-2036911-A1 PROCESS FOR PRODUCTION OF AMINATED PHOSPHORIC ACID ESTER COMPOUND, FLAME-RETARDANT RESIN, AND FLAME-RETARDANT RESIN COMPOSITION SHOWA HIGHPOLYMER CO., LTD. (JP) 2009-03-18 EP disclosed
US-20020013488-A1 High purity sterically hindered diaryl chlorophosphates and method for their preparation GENERAL ELECTRIC COMPANY 2002-01-31 US disclosed
US-4013520-A Process for separating 2,6-xylenol from a mixture of cresylic acids MELLON BANK, N.A. 1977-03-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020013488-A1 High purity sterically hindered diaryl chlorophosphates and method for their preparation CDC5L, INPPL1, PPIP5K2 MAPT 4268/4885LMNA 3142/4885SMN1; SMN2 4158/4885
US-20100298506-A1 METHOD FOR PRODUCING AN AMINO GROUP-CONTAINING PHOSPHATE COMPOUND, AND A FLAME-RETARDANT RESIN AND FLAME-RETARDANT RESIN COMPOSITION ATIC, GART, RPP30 MAPT 2201/4885LMNA 3985/4885SMN1; SMN2 4067/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.