SCHEMBL3758320

SCHEMBL3758320

COc1ccc(C(C#N)=NOS(=O)(=O)F)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NQO2 P16083 1/20 0.41
MAPT P10636 4/20 0.41
NPSR1 Q6W5P4 3/20 0.41
ALDH1A1 P00352 3/20 0.41
KDM4E B2RXH2 3/20 0.41
HPGD P15428 3/20 0.41
TSHR P16473 2/20 0.41
CYP1A2 P05177 1/20 0.41
CYP3A4 P08684 1/20 0.41
NFKB1 P19838 1/20 0.41
APEX1 P27695 1/20 0.41
BLM P54132 1/20 0.41
PMP22 Q01453 1/20 0.41
PDE4A P27815 1/20 0.40
PDE4B Q07343 1/20 0.40
PDE4C Q08493 1/20 0.40
PDE4D Q08499 1/20 0.40
MAPK1 P28482 2/20 0.40
PKM P14618 2/20 0.40
HSP90AA1 P07900 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL296645 0.88 NQO2 (0.43) NQO2MAPTNPSR1ALDH1A1KDM4E
SCHEMBL36568 0.88 NQO2 (0.43) NQO2MAPTNPSR1ALDH1A1KDM4E
SCHEMBL178354 0.86 RAB9A (0.40) NQO2MAPTNPSR1ALDH1A1KDM4E
SCHEMBL36047 0.86 RAB9A (0.40) NQO2MAPTNPSR1ALDH1A1KDM4E
SCHEMBL12459983 0.85 STS (0.47) NQO2MAPTNPSR1ALDH1A1KDM4E
SCHEMBL12110833 0.85 NQO2 (0.39) NQO2MAPTNPSR1ALDH1A1KDM4E
SCHEMBL36535 0.84 NQO2 (0.40) NQO2MAPTNPSR1ALDH1A1KDM4E
SCHEMBL5918261 0.84 EP300 (0.45) NQO2MAPTNPSR1ALDH1A1KDM4E
SCHEMBL297395 0.84 NQO2 (0.40) NQO2MAPTNPSR1ALDH1A1KDM4E
SCHEMBL5918260 0.84 EP300 (0.45) NQO2MAPTNPSR1ALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8298748-B2 Positive resist composition, method of forming resist pattern, and polymeric compound TOKYO OHKA KOGYO CO., LTD. (JP) 2012-10-30 US disclosed
US-20100297560-A1 POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2010-11-25 US disclosed