SCHEMBL3763112

SCHEMBL3763112

O=C(O)CCn1c(=O)n(-c2ccccc2)c(=O)n(-c2ccccc2)c1=O

nearest known ligand 0.54

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 1/20 0.54
▸ FABP3 P05413 1/20 0.51
▸ FABP4 P15090 1/20 0.51
▸ FABP5 Q01469 1/20 0.51
▸ GSK3A P49840 3/20 0.50
▸ GSK3B P49841 3/20 0.50
▸ APEX1 P27695 3/20 0.50
▸ HTT P42858 1/20 0.47
▸ L3MBTL1 Q9Y468 1/20 0.47
▸ ALDH1A1 P00352 3/20 0.45
▸ KDM4E B2RXH2 2/20 0.45
▸ HPGD P15428 1/20 0.45
▸ CMA1 P23946 2/20 0.43
▸ LMNA P02545 1/20 0.43
▸ TSHR P16473 1/20 0.43
▸ PGR P06401 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11714057 0.96 MAPT (0.54) MAPTFABP3FABP4FABP5GSK3A
SCHEMBL11712403 0.86 FABP4 (0.54) MAPTFABP3FABP4FABP5GSK3A
SCHEMBL8114006 0.82 MAPT (0.47) MAPTFABP3FABP4FABP5GSK3A
SCHEMBL30976973 0.78 APEX1 (0.63) GSK3AGSK3BAPEX1ALDH1A1KDM4E
SCHEMBL3763232 0.76 APEX1 (0.56) MAPTFABP3FABP4FABP5GSK3A
SCHEMBL113643 0.76 APEX1 (0.71) MAPTFABP3FABP4FABP5APEX1
SCHEMBL1722780 0.76 GSK3B (0.71) GSK3AGSK3BL3MBTL1ALDH1A1KDM4E
SCHEMBL11811986 0.76 APEX1 (0.70) MAPTFABP3FABP4FABP5APEX1
SCHEMBL11791224 0.74 PGR (0.64) GSK3AGSK3BALDH1A1KDM4ELMNA
SCHEMBL11593385 0.73 GSK3A (0.45) GSK3AGSK3BL3MBTL1ALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7846638-B2 Composition for forming anti-reflective coating for use in lithography NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-12-07 — — US disclosed
EP-1560070-B1 COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY NISSAN CHEMICAL IND LTD (JP) 2009-12-30 — — EP disclosed
US-7425399-B2 Composition for forming anti-reflective coating for use in lithography NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2008-09-16 — — US disclosed
US-20080206680-A1 Composition for forming anti-reflective coating for use in lithography NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2008-08-28 — — US disclosed
US-20060290429-A1 Composition form forming anti-reflective coating for use in lithography NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2006-12-28 — — US disclosed
EP-1560070-A1 COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY Nissan Chemical Industries, Ltd. (JP) 2005-08-03 — — EP disclosed
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