⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4388580 | 0.68 | LMNA (0.31) | — | |
| SCHEMBL6525074 | 0.67 | SMN1; SMN2 (0.30) | — | |
| SCHEMBL6525042 | 0.65 | POLB (0.40) | — | |
| SCHEMBL11698652 | 0.64 | TSHR (0.30) | — | |
| SCHEMBL11691565 | 0.62 | PDE2A (0.30) | — | |
| SCHEMBL109468 | 0.61 | LMNA (0.33) | — | |
| SCHEMBL1959317 | 0.61 | MEN1 (0.31) | — | |
| SCHEMBL28296177 | 0.61 | — | — | |
| SCHEMBL27524563 | 0.61 | CSNK2A2 (0.37) | — | |
| SCHEMBL6521615 | 0.61 | APAF1 (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7846638-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-12-07 | — | — | US | disclosed |
| EP-1560070-B1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY | NISSAN CHEMICAL IND LTD (JP) | 2009-12-30 | — | — | EP | disclosed |
| US-20080206680-A1 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-08-28 | — | — | US | disclosed |
| EP-1560070-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2005-08-03 | — | — | EP | disclosed |