SCHEMBL3779682

SCHEMBL3779682

O=C1OC(=O)C2C3CC(CC3O)C12

nearest known ligand 0.37

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.35
GMNN O75496 1/20 0.35
PPM1B O75688 1/20 0.35
LMNA P02545 1/20 0.35
PPP1CC P36873 1/20 0.35
TFPI2 P48307 1/20 0.35
RAB9A P51151 1/20 0.35
PPP5C P53041 1/20 0.35
PPP1CA P62136 1/20 0.35
PMP22 Q01453 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
TP53 P04637 1/20 0.35
CYP2D6 P10635 1/20 0.35
NFKB1 P19838 1/20 0.35
THPO P40225 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21500160 0.82 KDM4E (0.41) KDM4EGMNNPPM1BLMNAPPP1CC
SCHEMBL13559236 0.77
SCHEMBL13483383 0.75 KDM4E (0.35) KDM4EGMNNPPM1BLMNAPPP1CC
SCHEMBL19441377 0.75 KDM4E (0.35) KDM4EGMNNPPM1BLMNAPPP1CC
SCHEMBL3187298 0.75 KDM4E (0.35) KDM4EGMNNPPM1BLMNAPPP1CC
SCHEMBL23418371 0.75 KDM4E (0.35) KDM4EGMNNPPM1BLMNAPPP1CC
SCHEMBL572663 0.75 KDM4E (0.35) KDM4EGMNNPPM1BLMNAPPP1CC
SCHEMBL19670812 0.75 KDM4E (0.35) KDM4EGMNNPPM1BLMNAPPP1CC
SCHEMBL3187300 0.75 KDM4E (0.35) KDM4EGMNNPPM1BLMNAPPP1CC
SCHEMBL18193415 0.75 KDM4E (0.35) KDM4EGMNNPPM1BLMNAPPP1CC

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170153549-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING ORGANIC GROUP HAVING ALIPHATIC POLYCYCLIC STRUCTURE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-06-01 US disclosed
CN-101309950-B Tetracarboxylic acid compound, polyimide of the compound and method for producing the same MITSUBISHI CHEM CORP 2011-08-03 CN disclosed
US-20110045405-A1 (Meth)acrylate compound, photosensitive polymer, and resist composition CHEIL INDUSTRIES, INC. (KR) 2011-02-24 US disclosed
US-7795370-B2 Tetracarboxylic acid compound, polyimide thereof, and production method thereof MITSUBISHI CHEMICAL CORPORATION (JP) 2010-09-14 US disclosed
US-20090182114-A1 TETRACARBOXYLIC ACID COMPOUND, POLYIMIDE THEREOF, AND PRODUCTION METHOD THEREOF MITSUBISHI CHEMICAL CORPORATION (JP) 2009-07-16 US disclosed
CN-101309950-A Tetracarboxylic acid compound, polyimide of the compound and method for producing the same MITSUBISHI CHEM CORP (JP) 2008-11-19 CN disclosed
EP-1288186-B1 Preparation process of vinyl ether compounds DAICEL CHEM (JP) 2007-09-19 EP disclosed
US-7271297-B2 Process for producing vinyl ether compounds DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2007-09-18 US disclosed
EP-1826196-A2 Vinyl ether compounds Daicel Chemical Industries, Ltd. (JP) 2007-08-29 EP disclosed
US-20060205957-A1 Process for producing vinyl ether compounds ISHII YASUTAKA 2006-09-14 US disclosed
US-7074970-B2 Process for producing vinyl ether compounds DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2006-07-11 US disclosed
US-20030083529-A1 Process for producing vinyl ether compounds DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2003-05-01 US disclosed
EP-1288186-A2 Vinyl ether compounds and preparation process thereof Daicel Chemical Industries, Ltd. (JP) 2003-03-05 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110045405-A1 (Meth)acrylate compound, photosensitive polymer, and resist composition MMAB, ABCC1, WDR1 KDM4E 1788/4885GMNN 2452/4885PPM1B 282/4885
US-20090182114-A1 TETRACARBOXYLIC ACID COMPOUND, POLYIMIDE THEREOF, AND PRODUCTION METHOD THEREOF CA1, TTC14, F12 KDM4E 1312/4885GMNN 3353/4885PPM1B 4203/4885
US-20060205957-A1 Process for producing vinyl ether compounds ETV6, CYP3A4, SUV39H2 KDM4E 71/4885GMNN 2439/4885PPM1B 3575/4885
US-20030083529-A1 Process for producing vinyl ether compounds SRD5A2, RPS4X, RUVBL2 KDM4E 71/4885GMNN 2941/4885PPM1B 3682/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.