SCHEMBL3780561

SCHEMBL3780561

CC(C)c1cc(C(C)C)c(S(=O)(=O)[O-])c(C(C)C)c1.Oc1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FABP4 P15090 3/20 0.44
FABP3 P05413 2/20 0.44
FABP5 Q01469 1/20 0.44
GAA P10253 1/20 0.38
ESR1 P03372 1/20 0.36
PSEN1 P49768 2/20 0.35
PSEN2 P49810 2/20 0.35
APH1B Q8WW43 2/20 0.35
NCSTN Q92542 2/20 0.35
APH1A Q96BI3 2/20 0.35
PSENEN Q9NZ42 2/20 0.35
ENPP3 O14638 1/20 0.34
ENPP1 P22413 1/20 0.34
GABRA1 P14867 2/20 0.33
TDP1 Q9NUW8 1/20 0.33
NR3C1 P04150 1/20 0.33
GABRB2 P47870 1/20 0.33
PIK3CD O00329 1/20 0.33
PIK3CA P42336 1/20 0.33
PIK3CB P42338 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL383991 0.92 FABP4 (0.47) FABP4FABP3FABP5GAAPSEN1
SCHEMBL5549805 0.88 FABP4 (0.42) FABP4FABP3FABP5GAAPSEN1
SCHEMBL3779723 0.86 FABP4 (0.41) FABP4FABP3FABP5GAAENPP3
SCHEMBL547282 0.85 FABP4 (0.39) FABP4FABP3FABP5GAAPSEN1
SCHEMBL5549111 0.82 FABP4 (0.46) FABP4FABP3FABP5GAATDP1
SCHEMBL5549719 0.82 FABP4 (0.37) FABP4FABP3FABP5GAAPSEN1
SCHEMBL1953455 0.81 FABP4 (0.70) FABP4FABP3FABP5GAAPSEN1
SCHEMBL2634746 0.80 FABP4 (0.39) FABP4FABP3FABP5GAAPSEN1
SCHEMBL3407173 0.79 FABP4 (0.38) FABP4FABP3FABP5GAAPSEN1
SCHEMBL5549125 0.79 FABP4 (0.43) FABP4FABP3FABP5GAAENPP3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7858287-B2 Photosensitive resin, and photosensitive composition HYOGO PREFECTURE (JP) 2010-12-28 US disclosed
US-20090142697-A1 PHOTOSENSITIVE RESIN, AND PHOTOSENSITIVE COMPOSITION TOYO GOSEI CO., LTD. (JP) 2009-06-04 US disclosed