SCHEMBL3784433

SCHEMBL3784433

C=C(C)C(=O)OCC(C)(C)C(O)C(C)C.C=C(C)C(=O)OCC(OC(=O)C(=C)C)c1ccccc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.38
TRPA1 O75762 1/20 0.37
PABPC1 P11940 1/20 0.33
APOBEC3A P31941 1/20 0.33
APOBEC3G Q9HC16 1/20 0.33
ATM Q13315 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
HPGD P15428 1/20 0.33
CYP1A2 P05177 1/20 0.32
CYP2D6 P10635 1/20 0.32
PKM P14618 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
POLB P06746 1/20 0.32
APEX1 P27695 1/20 0.32
HTT P42858 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
SLC6A2 P23975 1/20 0.31
SLC6A4 P31645 1/20 0.31
SLC6A3 Q01959 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9334380 0.86 TSHR (0.40) TSHRPABPC1APOBEC3AAPOBEC3GATM
SCHEMBL57281 0.84 TSHR (0.47) TSHRPABPC1APOBEC3AAPOBEC3GL3MBTL1
Ethylene Glycol SCHEMBL21772119 0.81 TSHR (0.44) TSHRPABPC1APOBEC3AAPOBEC3GL3MBTL1
SCHEMBL1200994 0.79 TSHR (0.48) TSHRTRPA1POLBAPEX1HTT
SCHEMBL11420153 0.77 THRB (0.45) TSHRPABPC1APOBEC3AAPOBEC3GHPGD
Methacrylic Acid SCHEMBL11203462 0.76 POLB (0.36) TSHRPOLBAPEX1HTTTDP1
SCHEMBL18456926 0.74 TSHR (0.39) TSHRATML3MBTL1HPGDPOLB
SCHEMBL18456821 0.74 TSHR (0.39) TSHRATML3MBTL1HPGDPOLB
SCHEMBL15864686 0.72 TSHR (0.45) TSHRPABPC1APOBEC3AAPOBEC3GATM
SCHEMBL27371666 0.72 POLB (0.42) TSHRPABPC1APOBEC3AAPOBEC3GHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100159391-A1 PHOTOSENSITIVE PASTE AND PROCESS FOR PRODUCTION OF PATTERN USING THE SAME E. I. DU PONT DE NEMOURS AND COMPANY 2010-06-24 US disclosed