⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3117727 | 0.89 | — | — | |
| Toluene SCHEMBL378637 | 0.82 | ACHE (0.52) | — | |
| Toluene SCHEMBL600230 | 0.82 | ACHE (0.52) | — | |
| SCHEMBL378833 | 0.76 | ALDH1A1 (0.36) | — | |
| Benzene SCHEMBL1951518 | 0.76 | TP53 (0.38) | — | |
| Dioxane SCHEMBL378860 | 0.71 | TTR (0.35) | — | |
| Ether SCHEMBL7456930 | 0.67 | — | — | |
| Tetrahydrofuran SCHEMBL378714 | 0.67 | ALDH1A1 (0.42) | — | |
| SCHEMBL245064 | 0.66 | — | — | |
| SCHEMBL2252341 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 135 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2045275-B1 | Polycyclic resist compositions with increased etch resistance | SUMITOMO BAKELITE CO (JP) | 2012-01-25 | — | — | EP | claimed |
| EP-2045275-A2 | Polycyclic resist compositions with increased etch resistance | Sumitomo Bakelite Co., Ltd. (JP) | 2009-04-08 | — | — | EP | claimed |
| EP-0885405-B1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | SUMITOMO BAKELITE CO (JP) | 2005-06-08 | — | — | EP | claimed |
| US-6790579-B1 | PHOTOACID INITIATOR GENERATES ACID EFFECTING POLARITY CHANGE RENDERING POLYMER WATER SOLUBLE IN AREAS EXPOSED TO IMAGING SOURCE; INTEGRATED CIRCUITS, SEMICONDUCTORS | SUMITOMO BAKELITE CO., LTD. (JP) | 2004-09-14 | — | — | US | claimed |
| US-20030195298-A1 | Processes for making polymers containing pendant cyclic anhydride groups | SUMITOMO BAKELITE CO., LTD. | 2003-10-16 | — | — | US | claimed |
| EP-1163282-B1 | PROCESSES FOR MAKING POLYMERS CONTAINING PENDANT CYCLIC ANHYDRIDE GROUPS | SUMITOMO BAKELITE CO (JP) | 2003-05-28 | — | — | EP | claimed |
| US-6528598-B1 | E Ni(C6F5)2 and E represents a neutral electron donor; (toluene)bis(perfluorophenyl) nickel; | SUMITOMO BAKELITE CO., LTD. (JP) | 2003-03-04 | — | — | US | claimed |
| JP-2002538273-A | — | — | 2002-11-12 | — | — | JP | claimed |
| US-20020136982-A1 | Photoresist compositions comprising polycyclic polymers with acid labile pendant groups | THE B.F. GOODRICH COMPANY | 2002-09-26 | — | — | US | claimed |
| US-6451499-B1 | Polycyclic resist compositions with increased etch resistance | THE B.F. GOODRICH COMPANY | 2002-09-17 | — | — | US | claimed |
| US-6232417-B1 | USING COORDINATION CATALYST | THE B. F. GOODRICH COMPANY | 2001-05-15 | — | — | US | claimed |
| EP-1058699-A1 | POLYCYCLIC RESIST COMPOSITIONS WITH INCREASED ETCH RESISTANCE | THE B.F. GOODRICH COMPANY (US) | 2000-12-13 | — | — | EP | claimed |
| US-6147177-A | POLYCYCLIC POLYOLEFIN COMPRISING MONOMER(S) HAVING AROMATIC MOIETIES; RADIATION TRANSPARENT TO DEEP UV WAVELENGTHS FOR HIGH RESOLUTION PHOTOLITHOGRAPHY | THE B. F. GOODRICH COMPANY (US) | 2000-11-14 | — | — | US | claimed |
| US-6136499-A | RADIATION SENSITIVE PHOTORESIST COMPOSITION COMPRISING A PHOTOACID INITIATOR AND A POLYCYCLIC POLYMER COMPRISING REPEATING UNITS THAT CONTAIN PENDANT ACID LABILE GROUPS | THE B. F. GOODRICH COMPANY (US) | 2000-10-24 | — | — | US | claimed |
| WO-2000053657-A1 | PROCESSES FOR MAKING POLYMERS CONTAINING PENDANT CYCLIC ANHYDRIDE GROUPS | THE B.F. GOODRICH COMPANY (US) | 2000-09-14 | — | — | WO | claimed |
| EP-1021477-A1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | THE B.F. GOODRICH COMPANY (US) | 2000-07-26 | — | — | EP | claimed |
| WO-1999042502-A1 | POLYCYCLIC RESIST COMPOSITIONS WITH INCREASED ETCH RESISTANCE | THE B.F. GOODRICH COMPANY (US) | 1999-08-26 | — | — | WO | claimed |
| WO-1999014256-A1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | THE B.F. GOODRICH COMPANY (US) | 1999-03-25 | — | — | WO | claimed |
| EP-0885405-A1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | THE B.F. GOODRICH COMPANY (US) | 1998-12-23 | — | — | EP | claimed |
| WO-1997033198-A1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | THE B.F. GOODRICH COMPANY (US) | 1997-09-12 | — | — | WO | claimed |