Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.50 |
| ▸ | MAPT | P10636 | 7/20 | 0.50 |
| ▸ | RAB9A | P51151 | 5/20 | 0.50 |
| ▸ | NPC1 | O15118 | 4/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.50 |
| ▸ | MAOA | P21397 | 1/20 | 0.40 |
| ▸ | MAOB | P27338 | 1/20 | 0.40 |
| ▸ | PTPN7 | P35236 | 1/20 | 0.39 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.39 |
| ▸ | PTPN12 | Q05209 | 1/20 | 0.39 |
| ▸ | PTPN22 | Q9Y2R2 | 1/20 | 0.39 |
| ▸ | HCRTR1 | O43613 | 2/20 | 0.39 |
| ▸ | POLB | P06746 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 5/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.38 |
| ▸ | MEN1 | O00255 | 2/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31120514 | 1.00 | ALDH1A1 (0.50) | ALDH1A1MAPTRAB9ANPC1KDM4E | |
| SCHEMBL30998139 | 0.92 | MAPT (0.61) | ALDH1A1MAPTRAB9ANPC1KDM4E | |
| SCHEMBL85778 | 0.92 | MAPT (0.61) | ALDH1A1MAPTRAB9ANPC1KDM4E | |
| SCHEMBL18533259 | 0.85 | ALDH1A1 (0.47) | ALDH1A1MAPTRAB9ANPC1KDM4E | |
| SCHEMBL25852962 | 0.85 | THRB (0.44) | ALDH1A1MAPTKDM4EPTPN7DUSP3 | |
| SCHEMBL10600228 | 0.84 | MAPT (0.54) | ALDH1A1MAPTRAB9ANPC1KDM4E | |
| SCHEMBL11994246 | 0.84 | THRB (0.54) | ALDH1A1MAPTRAB9ANPC1KDM4E | |
| SCHEMBL16708721 | 0.84 | KDM4E (0.49) | ALDH1A1MAPTRAB9ANPC1KDM4E | |
| SCHEMBL25026543 | 0.83 | MAPT (0.41) | ALDH1A1MAPTRAB9ANPC1KDM4E | |
| SCHEMBL27660054 | 0.83 | MAPT (0.56) | ALDH1A1MAPTRAB9ANPC1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8414982-B2 | Process for the production of strongly adherent coatings | BASF SE (DE) | 2013-04-09 | — | — | US | disclosed |
| EP-1836002-B1 | PROCESS FOR THE PRODUCTION OF STRONGLY ADHERENT COATINGS | BASF SE (DE) | 2012-08-29 | — | — | EP | disclosed |
| US-20100178512-A1 | CHANGING SURFACE PROPERTIES BY FUNCTIONALIZED NANOPARTICLES | CIBA CORPORATION (US) | 2010-07-15 | — | — | US | disclosed |
| US-20090092768-A1 | Process for the Production of Strongly Adherent Coatings | CIBA SPECIALTY CHEMICALS CORP. | 2009-04-09 | — | — | US | disclosed |
| US-7455891-B2 | Process for the production of strongly adherent coatings | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 2008-11-25 | — | — | US | disclosed |
| US-20070128441-A1 | Process for the production of strongly adherent coatings | CIBA SPECIALTY CHEMICALS CORP. | 2007-06-07 | — | — | US | disclosed |
| EP-1772479-A1 | Silicon coated release substrate | Ciba Specialty Chemicals Holding Inc. (CH) | 2007-04-11 | — | — | EP | disclosed |
| US-20060257575-A1 | Process for the production of strongly adherent coatings | CIBA SPECIALTY CHEMICALS CORP. | 2006-11-16 | — | — | US | disclosed |
| EP-1472009-B1 | PROCESS FOR THE PRODUCTION OF STRONGLY ADHERENT COATINGS | CIBA SC HOLDING AG (CH) | 2005-12-28 | — | — | EP | disclosed |
| US-20050147919-A1 | Process for the production of strongly adherent coatings | CIBA SPECIALTY CHEMICALS CORP. | 2005-07-07 | — | — | US | disclosed |
| EP-1498189-A1 | Anti-fog coatings on thermoplastic substrates | Ciba SC Holding AG (CH) | 2005-01-19 | — | — | EP | disclosed |
| EP-1135219-B1 | METHOD FOR PRODUCING ADHESIVE SURFACE COATINGS | CIBA SC HOLDING AG (CH) | 2004-01-28 | — | — | EP | disclosed |
| US-6548121-B1 | Subjecting substrate to action of low-temperature plasma discharge or radiation, applying photoinitiator containing ethylenically unsaturated group, curing, depositing metal or oxide | CIBA SPECIALTY CHEMICALS CORPORATION | 2003-04-15 | — | — | US | disclosed |