SCHEMBL379587

SCHEMBL379587

CC(C)(C)c1cccc(I)c1C(C)(C)C.O=S(=O)(O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.34
CA2 P00918 12/20 0.33
CA1 P00915 11/20 0.33
MMP1 P03956 5/20 0.33
MMP2 P08253 5/20 0.33
MMP9 P14780 5/20 0.33
MMP8 P22894 5/20 0.33
MMP13 P45452 5/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3999825 0.99 CA2 (0.34) HSD11B1CA2CA1MMP1MMP2
SCHEMBL5826443 0.87 HSD11B1 (0.39) HSD11B1CA2CA1MMP1MMP2
SCHEMBL28681870 0.86 CA2 (0.38) HSD11B1CA2CA1MMP1MMP2
SCHEMBL5826458 0.86 CA2 (0.38) HSD11B1CA2CA1MMP1MMP2
Trifluoromethanesulfonic Acid SCHEMBL1286190 0.86 CA2 (0.37) HSD11B1CA2
SCHEMBL6544073 0.81 CA2 (0.41) HSD11B1CA2
SCHEMBL270850 0.77 CA1 (0.33) CA2CA1MMP1MMP2MMP9
SCHEMBL1286248 0.77 HSD11B1 (0.40) HSD11B1
SCHEMBL668286 0.76 CA2 (0.35) CA2CA1MMP1MMP2MMP9
SCHEMBL1285882 0.75 CA2 (0.46) CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 95 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2297613-B1 ORTHOGONAL PROCESSING OF ORGANIC MATERIALS USED IN ELECTRONIC AND ELECTRICAL DEVICES UNIV CORNELL (US) 2017-11-29 EP claimed
US-8846301-B2 Orthogonal processing of organic materials used in electronic and electrical devices CORNELL UNIVERSITY (US) 2014-09-30 US claimed
US-20110159252-A1 Orthogonal Procesing of Organic Materials Used in Electronic and Electrical Devices NATIONAL SCIENCE FOUNDATION 2011-06-30 US claimed
EP-2297613-A2 ORTHOGONAL PROCESSING OF ORGANIC MATERIALS USED IN ELECTRONIC AND ELECTRICAL DEVICES Cornell University (US) 2011-03-23 EP claimed
WO-2009143357-A2 ORTHOGONAL PROCESSING OF ORGANIC MATERIALS USED IN ELECTRONIC AND ELECTRICAL DEVICES CORNELL UNIVERSITY (US) 2009-11-26 WO claimed
US-6872504-B2 High sensitivity X-ray photoresist MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2005-03-29 US claimed
US-20040110091-A1 High sensitivity X-ray photoresist MASS INSTITUTE OF TECHNOLOGY (MIT) 2004-06-10 US claimed
US-10838302-B2 Cross-linkable fluorinated photopolymer ORTHOGONAL, INC. (US) 2020-11-17 US disclosed
US-20200301276-A1 CROSS-LINKABLE FLUORINATED PHOTOPOLYMER ORTHOGONAL, INC. (US) 2020-09-24 US disclosed
US-10739680-B2 Cross-linkable fluorinated photopolymer ORTHOGONAL, INC. (US) 2020-08-11 US disclosed
EP-3025197-B1 CROSS-LINKABLE FLUORINATED PHOTOPOLYMER ORTHOGONAL INC (US) 2020-03-18 EP disclosed
US-10410914-B2 Methods for providing lithography features on a substrate by self-assembly of block copolymers ASML NETHERLANDS B.V. (NL) 2019-09-10 US disclosed
US-20190227436-A1 CROSS-LINKABLE FLUORINATED PHOTOPOLYMER ORTHOGONAL, INC. (US) 2019-07-25 US disclosed
US-20020081520-A1 Substantially transparent aqueous base soluble polymer system for use in 157 nm resist applications GLOBALFOUNDRIES INC. (KY) 2002-06-27 US disclosed
US-20020055061-A1 Novel polymers and photoresist compositions for short short wavelength imaging SHIPLEY COMPANY, L.L.C. 2002-05-09 US disclosed
WO-2002021213-A2 NOVEL POLYMERS AND PHOTORESIST COMPOSITIONS FOR SHORT WAVELENGTH IMAGING SHIPLEY COMPANY, L.L.C. (US) 2002-03-14 WO disclosed
EP-1164127-A1 PROCESS FOR PRODUCING ONIUM SALT DERIVATIVE AND NOVEL ONIUM SALT DERIVATIVE Toyo Gosei Kogyo Co., Ltd. (JP) 2001-12-19 EP disclosed
EP-1058699-A1 POLYCYCLIC RESIST COMPOSITIONS WITH INCREASED ETCH RESISTANCE THE B.F. GOODRICH COMPANY (US) 2000-12-13 EP disclosed
US-6147177-A POLYCYCLIC POLYOLEFIN COMPRISING MONOMER(S) HAVING AROMATIC MOIETIES; RADIATION TRANSPARENT TO DEEP UV WAVELENGTHS FOR HIGH RESOLUTION PHOTOLITHOGRAPHY THE B. F. GOODRICH COMPANY (US) 2000-11-14 US disclosed
WO-1999042502-A1 POLYCYCLIC RESIST COMPOSITIONS WITH INCREASED ETCH RESISTANCE THE B.F. GOODRICH COMPANY (US) 1999-08-26 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110159252-A1 Orthogonal Procesing of Organic Materials Used in Electronic and Electrical Devices FRG1, RARG, NPM1 HSD11B1 2036/4885CA2 1826/4885CA1 2412/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.