SCHEMBL3797329

SCHEMBL3797329

C=COC(=O)OC1(C(=O)C2(OC(=O)OC=C)CCCCC2c2ccccc2)CCCCC1c1ccccc1

nearest known ligand 0.33

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
FABP7 O15540 3/20 0.33
FABP5 Q01469 3/20 0.33
FABP3 P05413 2/20 0.31
ALDH1A1 P00352 2/20 0.31
MEN1 O00255 1/20 0.31
POLB P06746 1/20 0.31
KMT2A Q03164 1/20 0.31
TSHR P16473 1/20 0.30
RAB9A P51151 1/20 0.30
SLC6A9 P48067 1/20 0.30
KDM1A O60341 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8384320 0.85 THRB (0.35) FABP7FABP5FABP3ALDH1A1MEN1
SCHEMBL3797331 0.81 FABP7 (0.32) FABP7FABP5FABP3
SCHEMBL5510274 0.69 GAA (0.38) ALDH1A1KDM1A
SCHEMBL8384323 0.68 FABP7 (0.33) FABP7FABP5FABP3TSHRSLC6A9
SCHEMBL2791867 0.68 AKR1C1 (0.43) MEN1KMT2AKDM1A
SCHEMBL151522 0.68 TSHR (0.41) FABP7FABP5FABP3ALDH1A1TSHR
SCHEMBL6549880 0.67 AKT1 (0.35) ALDH1A1MEN1POLBKMT2ATSHR
SCHEMBL8323357 0.66 TSHR (0.45) ALDH1A1MEN1KMT2ATSHRKDM1A
SCHEMBL10767178 0.66 AKR1C1 (0.43) FABP7FABP5FABP3ALDH1A1TSHR
SCHEMBL10526589 0.65 AKR1C1 (0.47) KDM1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8414982-B2 Process for the production of strongly adherent coatings BASF SE (DE) 2013-04-09 US disclosed
EP-1836002-B1 PROCESS FOR THE PRODUCTION OF STRONGLY ADHERENT COATINGS BASF SE (DE) 2012-08-29 EP disclosed
US-20100178512-A1 CHANGING SURFACE PROPERTIES BY FUNCTIONALIZED NANOPARTICLES CIBA CORPORATION (US) 2010-07-15 US disclosed
EP-2086693-A2 CHANGING SURFACE PROPERTIES BY FUNCTIONALIZED NANOPARTICLES Ciba Holding Inc. (CH) 2009-08-12 EP disclosed
US-20090092768-A1 Process for the Production of Strongly Adherent Coatings CIBA SPECIALTY CHEMICALS CORP. 2009-04-09 US disclosed
US-7455891-B2 Process for the production of strongly adherent coatings CIBA SPECIALTY CHEMICALS CORPORATION (US) 2008-11-25 US disclosed
WO-2008068154-A2 CHANGING SURFACE PROPERTIES BY FUNCTIONALIZED NANOPARTICLES CIBA HOLDING INC. (CH) 2008-06-12 WO disclosed
EP-1836002-A2 PROCESS FOR THE PRODUCTION OF STRONGLY ADHERENT COATINGS Ciba Specialty Chemicals Holding Inc. (CH) 2007-09-26 EP disclosed
US-20070128441-A1 Process for the production of strongly adherent coatings CIBA SPECIALTY CHEMICALS CORP. 2007-06-07 US disclosed
EP-1772479-A1 Silicon coated release substrate Ciba Specialty Chemicals Holding Inc. (CH) 2007-04-11 EP disclosed
EP-1651792-A1 PROCESS FOR THE PRODUCTION OF STRONGLY ADHERENT COATINGS Ciba SC Holding AG (CH) 2006-05-03 EP disclosed
EP-1472009-B1 PROCESS FOR THE PRODUCTION OF STRONGLY ADHERENT COATINGS CIBA SC HOLDING AG (CH) 2005-12-28 EP disclosed
WO-2005089957-A1 PROCESS FOR THE PRODUCTION OF STRONGLY ADHERENT COATINGS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2005-09-29 WO disclosed
US-20050147919-A1 Process for the production of strongly adherent coatings CIBA SPECIALTY CHEMICALS CORP. 2005-07-07 US disclosed
WO-2005021824-A2 PROCESS FOR THE PRODUCTION OF STRONGLY ADHERENT COATINGS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2005-03-10 WO disclosed
WO-2005014874-A1 PROCESS FOR THE PRODUCTION OF STRONGLY ADHERENT COATINGS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2005-02-17 WO disclosed
EP-1498189-A1 Anti-fog coatings on thermoplastic substrates Ciba SC Holding AG (CH) 2005-01-19 EP disclosed
EP-1472009-A1 PROCESS FOR THE PRODUCTION OF STRONGLY ADHERENT COATINGS Ciba Specialty Chemicals Holding Inc. (CH) 2004-11-03 EP disclosed
WO-2003064061-A1 PROCESS FOR THE PRODUCTION OF STRONGLY ADHERENT COATINGS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2003-08-07 WO disclosed
US-6548121-B1 Subjecting substrate to action of low-temperature plasma discharge or radiation, applying photoinitiator containing ethylenically unsaturated group, curing, depositing metal or oxide CIBA SPECIALTY CHEMICALS CORPORATION 2003-04-15 US disclosed