SCHEMBL3801540

SCHEMBL3801540

Oc1c(S)cc(S)cc1S

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10826043 0.73 TSHR (0.50)
SCHEMBL11027321 0.73 SELL (0.50)
SCHEMBL22014111 0.71 SELL (0.47)
SCHEMBL10826108 0.71
SCHEMBL331107 0.69
SCHEMBL14823655 0.67 GABRA1 (0.52)
SCHEMBL63242 0.67 ACHE (0.43)
SCHEMBL9509241 0.67 HSD17B10 (0.58)
SCHEMBL10798792 0.67 SELL (0.36)
SCHEMBL3363047 0.67 CA1 (0.58)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9795549-B2 1,2-alkane polyol-containing composition OSAKA ORGANIC CHEMICAL INDUSTRY LTD. (JP) 2017-10-24 US disclosed
US-20160045414-A1 1,2-ALKANE POLYOL-CONTAINING COMPOSITION OSAKA ORGANIC CHEMICAL INDUSTRY LTD. (JP) 2016-02-18 US disclosed
EP-2985017-A1 1,2-ALKANE POLYOL-CONTAINING COMPOSITION Osaka Organic Chemical Ind., Ltd. (JP) 2016-02-17 EP disclosed
US-8222141-B2 Method for producing an organometallic layer FORSCHUNGZENTRUM KARLSRUHE GMBH (DE) 2012-07-17 US disclosed
US-20100273328-A1 METHOD FOR PRODUCING AN ORGANOMETALLIC LAYER FORSCHUNGSZENTRUM KARLSRUHE GMBH (DE) 2010-10-28 US disclosed
EP-1888258-A1 METHOD FOR PRODUCING AN ORGANOMETALLIC LAYER Forschungszentrum Karlsruhe GmbH (DE) 2008-02-20 EP disclosed
WO-2006131194-A1 METHOD FOR PRODUCING AN ORGANOMETALLIC LAYER FORSCHUNGSZENTRUM KARLSRUHE GMBH (DE) 2006-12-14 WO disclosed
US-6534589-B1 Catalytic curing and polymerization of episulfide compound in presence of phenolic compound MITSUBISHI GAS CHEMICAL COMPANY INC. (JP) 2003-03-18 US disclosed
US-6365223-B1 HYDROPHOBIC RESINS CONTAINING SULFUR, SUCH AS POLYTHIOETHERS, DIPPING INTO A LIQUID COMPRISING AN INORGANIC AND/OR AN ORGANIC ACID; THE ORGANIC ACID IS A MIXTURE OF A SULFONIC ACID COMPOUND AND A PHENOL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2002-04-02 US disclosed
EP-1024223-A2 Process for tinting a resin for optical materials MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-08-02 EP disclosed
EP-1006374-A2 Process for producing a resin having a large refractive index MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-06-07 EP disclosed
US-3979369-A DIENE POLYMER MONSANTO COMPANY (US) 1976-09-07 US disclosed