Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Formic Acid SCHEMBL5573577 | 0.85 | FDPS (0.30) | ALDH1A1CYP2C19 | |
| SCHEMBL144710 | 0.84 | — | — | |
| SCHEMBL3644046 | 0.84 | — | — | |
| Formic Acid SCHEMBL8505568 | 0.82 | — | — | |
| Hydrogen Peroxide SCHEMBL10659944 | 0.81 | — | — | |
| Water SCHEMBL190438 | 0.81 | — | — | |
| Fluoride SCHEMBL190901 | 0.81 | — | — | |
| Hydrochloric Acid SCHEMBL718322 | 0.81 | — | — | |
| Tert-Butylamine SCHEMBL8647449 | 0.77 | — | — | |
| Formic Acid SCHEMBL3682015 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119798586-A | Preparation method of polyisocyanate composition | 万华化学集团股份有限公司 | 2025-04-11 | — | — | CN | claimed |
| CN-118165226-A | Preparation method of polyisocyanate composition | 万华化学（宁波）有限公司 | 2024-06-11 | — | — | CN | claimed |
| CN-118165221-A | Allophanate composition, polyisocyanate composition, and preparation methods and applications thereof | 万华化学（宁波）有限公司 | 2024-06-11 | — | — | CN | claimed |
| CN-113698572-B | Polyisocyanate composition, preparation method and application | 万华化学（宁波）有限公司 | 2023-12-19 | — | — | CN | claimed |
| CN-116854890-A | Preparation method of polyisocyanate composition | 万华化学集团股份有限公司 | 2023-10-10 | — | — | CN | claimed |
| CN-115246793-B | Preparation method of diisocyanate trimer, catalyst and preparation method thereof | 山东新和成精化科技有限公司 | 2023-07-07 | — | — | CN | claimed |
| CN-113265037-B | Polyisocyanate composition and preparation method and application thereof | 万华化学（宁波）有限公司 | 2023-03-24 | — | — | CN | claimed |
| WO-2022241616-A1 | POLYISOCYANATE COMPOSITION, PREPARATION METHOD THEREFOR AND APPLICATION THEREOF | 万华化学（宁波）有限公司 | 2022-11-24 | — | — | WO | claimed |
| CN-113698572-A | Polyisocyanate composition, preparation method and application | 万华化学（宁波）有限公司 | 2021-11-26 | — | — | CN | claimed |
| CN-113265037-A | Polyisocyanate composition and preparation method and application thereof | 万华化学（宁波）有限公司 | 2021-08-17 | — | — | CN | claimed |
| CN-120137141-A | Polyisocyanate composition, preparation method thereof and coating composition | 万华化学集团股份有限公司 | 2025-06-13 | — | — | CN | disclosed |
| CN-120059127-A | Polyisocyanate composition and coating composition | 万华化学集团股份有限公司 | 2025-05-30 | — | — | CN | disclosed |
| CN-119798586-A | Preparation method of polyisocyanate composition | 万华化学集团股份有限公司 | 2025-04-11 | — | — | CN | disclosed |
| CN-119505173-A | Polyisocyanate composition, coating composition and application | 万华化学集团股份有限公司 | 2025-02-25 | — | — | CN | disclosed |
| CN-118290706-A | Preparation method of polyisocyanate composition | 万华化学（宁波）有限公司 | 2024-07-05 | — | — | CN | disclosed |
| CN-113698572-A | Polyisocyanate composition, preparation method and application | 万华化学（宁波）有限公司 | 2021-11-26 | — | — | CN | disclosed |
| CN-113265037-A | Polyisocyanate composition and preparation method and application thereof | 万华化学（宁波）有限公司 | 2021-08-17 | — | — | CN | disclosed |
| EP-2089774-A2 | DEVICE MANUFACTURING PROCESS UTILIZING A DOUBLE PATTERING PROCESS | FujiFilm Electronic Materials USA, Inc. (US) | 2009-08-19 | — | — | EP | disclosed |
| US-20080199814-A1 | Device manufacturing process utilizing a double patterning process | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. | 2008-08-21 | — | — | US | disclosed |
| WO-2008070060-A2 | DEVICE MANUFACTURING PROCESS UTILIZING A DOUBLE PATTERING PROCESS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2008-06-12 | — | — | WO | disclosed |