SCHEMBL3822702

SCHEMBL3822702

Cc1ccc(S(=O)(=O)ON2C(=O)c3ccc(Oc4ccc5c(c4)C(=O)N(OS(=O)(=O)c4ccc(C)cc4)C5=O)cc3C2=O)cc1

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
VDR P11473 3/20 0.68
KDM4E B2RXH2 10/20 0.59
ALDH1A1 P00352 9/20 0.59
HPGD P15428 7/20 0.59
KMT2A Q03164 9/20 0.53
MAPT P10636 9/20 0.53
MEN1 O00255 6/20 0.52
F2 P00734 4/20 0.51
HTT P42858 4/20 0.50
XBP1 P17861 2/20 0.50
LPAR1 Q92633 1/20 0.49
LPAR3 Q9UBY5 1/20 0.49
POLB P06746 1/20 0.47
NPSR1 Q6W5P4 2/20 0.46
LMNA P02545 2/20 0.46
CYP1A2 P05177 1/20 0.46
CYP3A4 P08684 1/20 0.46
CYP2C19 P33261 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
TDP1 Q9NUW8 2/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14620101 0.90 VDR (0.67) VDRKDM4EALDH1A1HPGDKMT2A
SCHEMBL3844039 0.90 VDR (0.55) VDRKDM4EALDH1A1HPGDKMT2A
SCHEMBL3829861 0.89 KMT2A (0.68) VDRKDM4EALDH1A1HPGDKMT2A
SCHEMBL5556208 0.88 VDR (0.77) VDRKDM4EALDH1A1HPGDKMT2A
SCHEMBL3824625 0.87 KDM4E (0.58) VDRKDM4EALDH1A1HPGDKMT2A
SCHEMBL3826022 0.87 KDM4E (0.51) VDRKDM4EALDH1A1HPGDKMT2A
SCHEMBL3825331 0.87 KDM4E (0.58) VDRKDM4EALDH1A1HPGDKMT2A
SCHEMBL3824621 0.87 KDM4E (0.71) VDRKDM4EALDH1A1HPGDKMT2A
SCHEMBL3827252 0.87 KDM4E (0.71) VDRKDM4EALDH1A1HPGDKMT2A
SCHEMBL5551949 0.86 VDR (0.65) VDRKDM4EALDH1A1HPGDKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8173349-B2 Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device FUJIFILM CORPORATION (JP) 2012-05-08 US disclosed
US-20100080963-A1 PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMING A PATTERN, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed
US-7615324-B2 Photosensitive composition, and cured relief pattern production method and semiconductor device using the same FUJIFILM CORPORATION (JP) 2009-11-10 US disclosed
EP-1449833-B1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION WAKO PURE CHEM IND LTD (JP) 2009-09-09 EP disclosed
US-20080227024-A1 PHOTOSENSITIVE COMPOSITION, AND CURED RELIEF PATTERN PRODUCTION METHOD AND SEMICONDUCTOR DEVICE USING THE SAME FUJIFILM CORPORATION (JP) 2008-09-18 US disclosed
US-7374857-B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2008-05-20 US disclosed
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2005-02-17 US disclosed
EP-1449833-A1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2004-08-25 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition ASIC1, GAR1, RER1 VDR 4831/4885KDM4E 2501/4885ALDH1A1 633/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.