Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 8/20 | 0.44 |
| ▸ | MEN1 | O00255 | 5/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 10/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.43 |
| ▸ | MAPT | P10636 | 9/20 | 0.43 |
| ▸ | HPGD | P15428 | 7/20 | 0.43 |
| ▸ | VDR | P11473 | 3/20 | 0.41 |
| ▸ | F2 | P00734 | 5/20 | 0.39 |
| ▸ | HTT | P42858 | 3/20 | 0.39 |
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | XBP1 | P17861 | 2/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.36 |
| ▸ | THRB | P10828 | 1/20 | 0.34 |
| ▸ | MASP2 | O00187 | 1/20 | 0.34 |
| ▸ | CA12 | O43570 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3824343 | 0.91 | KMT2A (0.51) | KMT2AMEN1KDM4EALDH1A1MAPT | |
| SCHEMBL3827232 | 0.89 | KDM4E (0.47) | KMT2AMEN1KDM4EALDH1A1MAPT | |
| SCHEMBL3823299 | 0.86 | KDM4E (0.62) | KMT2AMEN1KDM4EALDH1A1MAPT | |
| SCHEMBL3824392 | 0.86 | KMT2A (0.62) | KMT2AMEN1KDM4EALDH1A1MAPT | |
| SCHEMBL3826650 | 0.85 | VDR (0.60) | KMT2AMEN1KDM4EALDH1A1MAPT | |
| SCHEMBL6743844 | 0.84 | KDM4E (0.62) | KMT2AMEN1KDM4EALDH1A1MAPT | |
| SCHEMBL3823040 | 0.84 | KDM4E (0.52) | KMT2AMEN1KDM4EALDH1A1MAPT | |
| SCHEMBL3828348 | 0.84 | KDM4E (0.52) | KMT2AMEN1KDM4EALDH1A1MAPT | |
| SCHEMBL3824476 | 0.84 | KMT2A (0.49) | KMT2AMEN1KDM4EALDH1A1MAPT | |
| SCHEMBL3823498 | 0.84 | KMT2A (0.45) | KMT2AMEN1KDM4EALDH1A1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1449833-B1 | BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION | WAKO PURE CHEM IND LTD (JP) | 2009-09-09 | — | — | EP | claimed |
| US-7374857-B2 | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2008-05-20 | — | — | US | claimed |
| US-20050038261-A1 | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2005-02-17 | — | — | US | claimed |
| EP-1449833-A1 | BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION | Wako Pure Chemical Industries, Ltd. (JP) | 2004-08-25 | — | — | EP | claimed |
| EP-1449833-B1 | BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION | WAKO PURE CHEM IND LTD (JP) | 2009-09-09 | — | — | EP | disclosed |
| US-7374857-B2 | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2008-05-20 | — | — | US | disclosed |
| US-20050038261-A1 | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2005-02-17 | — | — | US | disclosed |
| EP-1449833-A1 | BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION | Wako Pure Chemical Industries, Ltd. (JP) | 2004-08-25 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20050038261-A1 | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition | ASIC1, GAR1, RER1 | KMT2A 1016/4885MEN1 211/4885KDM4E 2501/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.