SCHEMBL383279

SCHEMBL383279

CCCC[N+](CCCC)(CCCC)Cc1ccccc1.F[B-](F)(F)F

nearest known ligand 0.51

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 2/20 0.51
MEN1 O00255 2/20 0.50
KMT2A Q03164 2/20 0.50
SMN1; SMN2 Q16637 2/20 0.50
TP53 P04637 2/20 0.50
MAPK1 P28482 1/20 0.50
HTT P42858 2/20 0.49
CYP1A2 P05177 1/20 0.44
KDM4E B2RXH2 1/20 0.41
ALDH1A1 P00352 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
SLC22A1 O15245 1/20 0.39
CNR2 P34972 2/20 0.38
BCHE P06276 1/20 0.38
ACHE P22303 1/20 0.38
CHRNB4 P30926 1/20 0.37
CHRNA3 P32297 1/20 0.37
CHRNA7 P36544 1/20 0.37
SIGMAR1 Q99720 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL81000 0.92 DNM1 (0.58) DNM1MEN1KMT2ASMN1; SMN2TP53
Hydrogen Sulfide SCHEMBL5998244 0.92 DNM1 (0.58) DNM1MEN1KMT2ASMN1; SMN2TP53
Bromide SCHEMBL29110287 0.90 DNM1 (0.56) DNM1MEN1KMT2ASMN1; SMN2TP53
Fluoride Ion SCHEMBL636828 0.90 DNM1 (0.56) DNM1MEN1KMT2ASMN1; SMN2TP53
Bromide SCHEMBL28701241 0.90 DNM1 (0.56) DNM1MEN1KMT2ASMN1; SMN2TP53
Bromide SCHEMBL240143 0.90 DNM1 (0.59) DNM1MEN1KMT2ASMN1; SMN2TP53
Hydrogen Sulfide SCHEMBL5998240 0.90 DNM1 (0.56) DNM1MEN1KMT2ASMN1; SMN2TP53
Bromide SCHEMBL29110289 0.90 DNM1 (0.59) DNM1MEN1KMT2ASMN1; SMN2TP53
Iodide SCHEMBL239944 0.90 DNM1 (0.56) DNM1MEN1KMT2ASMN1; SMN2TP53
Water SCHEMBL187669 0.90 DNM1 (0.56) DNM1MEN1KMT2ASMN1; SMN2TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2015124417-A1 COMPOSITION OF A POLY IONIC LIQUID AND A METAL COMPOUND FOR THE DETECTION OF CO2 GAS AT LOW TEMPERATURES ETH ZURICH (CH) 2015-08-27 WO claimed
EP-2910940-A1 Composition of a poly ionic liquid and a metal compound for the detection of CO2 gas at low temperatures ETH Zurich (CH) 2015-08-26 EP claimed
US-5730890-A Method for conditioning halogenated polymeric materials and structures fabricated therewith INTERNATIONL BUSINESS MACHINES CORPORATION (US) 1998-03-24 US claimed
US-5709906-A DEPOSITING AND DOPING THE SURFACE OF THE POLYMER SUBSTRATE WITH A METAL SEED OR CATALYST BY REDUCING A METAL SALT USING A REDUCING AGENT AND APROTIC SOLVENT TO IMPROVE THE ADHESION OF AN OVERLYING CONDUCTIVE METAL LAYER INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1998-01-20 US claimed
EP-0419804-B1 Multilayer structures of different electroactive materials and methods of fabrication thereof IBM (US) 1997-12-29 EP claimed
EP-0409002-B1 Process for nucleophilic derivatization of materials having an imide group conjugated to an aromatic moiety IBM (US) 1996-06-12 EP claimed
EP-0409003-B1 Derivatives of compounds containing a carbonyl group conjugated to an aromatic moiety and electrophilic methods of fabrication thereof IBM (US) 1996-02-07 EP claimed
US-5462628-A Conditioning surface of polymeric material by reducing, bring two surfaces together to form interphase, reoxidizing INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1995-10-31 US claimed
US-5443865-A Method for conditioning a substrate for subsequent electroless metal deposition INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1995-08-22 US claimed
US-5374454-A Dehalogenation of halogenated polymer with a reducing agent, metallization with metal in positive oxidation state giving catalytic sites; photoresists; etching, doping, patterning INTERNATIONAL BUSINESS MACHINES INCORPORATED (US) 1994-12-20 US claimed
US-5242713-A Metallizing polyimide film INTERNATIONAL BUSINESS MACHINES CORPORATION 1993-09-07 US claimed
US-5203955-A Supplying electrons to redox sites of a polymer and then dissolving the polymer in an aprotic solvent INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1993-04-20 US claimed
US-5104944-A Redox system INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1992-04-14 US claimed
EP-0477543-A2 Method for conditioning halogenated polymeric materials and structures fabricated therewith International Business Machines Corporation (US) 1992-04-01 EP claimed
US-5045159-A Derivatives of compounds containing a carbonyl group conjugated to an aromatic moiety and electrophilic methods of fabrication thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1991-09-03 US claimed
US-5021129-A Multilayer structures of different electroactive materials and methods of fabrication thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1991-06-04 US claimed
EP-0419804-A2 Multilayer structures of different electroactive materials and methods of fabrication thereof International Business Machines Corporation (US) 1991-04-03 EP claimed
EP-0409002-A2 Process for nucleophilic derivatization of materials having an imide group conjugated to an aromatic moiety International Business Machines Corporation (US) 1991-01-23 EP claimed
EP-0409003-A2 Derivatives of compounds containing a carbonyl group conjugated to an aromatic moiety and electrophilic methods of fabrication thereof International Business Machines Corporation (US) 1991-01-23 EP claimed
EP-0374487-A2 Method for conditioning an organic polymeric material International Business Machines Corporation (US) 1990-06-27 EP claimed