SCHEMBL383318

SCHEMBL383318

CC1(COCOCOCC2(C)COC2)COC1

nearest known ligand 0.44

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.44
DHFR P00374 1/20 0.30
DCPS Q96C86 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4091211 0.97 EPHX1 (0.46) EPHX1DHFRDCPS
SCHEMBL10071380 0.91 EPHX1 (0.38) EPHX1
SCHEMBL10071387 0.91 EPHX1 (0.38) EPHX1
SCHEMBL10071394 0.91 EPHX1 (0.38) EPHX1
SCHEMBL1978276 0.87 EPHX1 (0.50) EPHX1DHFRDCPS
SCHEMBL17133610 0.86 EPHX1 (0.39) EPHX1
SCHEMBL10071381 0.86 EPHX1 (0.41) EPHX1
SCHEMBL2831544 0.82 EPHX1 (0.46) EPHX1DHFRDCPS
SCHEMBL5369782 0.80
SCHEMBL2828604 0.80 EPHX1 (0.44) EPHX1DHFRDCPS

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 472 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120044753-B Photosensitive dry film, photosensitive resin composition, cured film and printed circuit board Hangzhou foster Electronic Materials Co.,Ltd. (CN) 2026-05-26 CN claimed
CN-120044753-A Photosensitive dry film, photosensitive resin composition, cured film and printed circuit board 杭州福斯特电子材料有限公司 2025-05-27 CN claimed
CN-120044753-B Photosensitive dry film, photosensitive resin composition, cured film and printed circuit board Hangzhou foster Electronic Materials Co.,Ltd. (CN) 2026-05-26 CN disclosed
US-12443101-B2 Cured coating film TAIYO HOLDINGS CO., LTD. (JP) 2025-10-14 US disclosed
US-20250297048-A1 (METH)ACRYLATE-BASED RESIN, AND DRY FILM SOLDER RESIST COMPRISING SAME LG CHEM, LTD. (KR) 2025-09-25 US disclosed
US-20250277073-A1 CURABLE COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE FUJIFILM CORPORATION (JP) 2025-09-04 US disclosed
EP-3778805-B1 CURABLE COMPOSITION FOR INKJET, CURED PRODUCT OF SAME, AND ELECTRONIC COMPONENT COMPRISING SAID CURED PRODUCT TAIYO HOLDINGS CO LTD (JP) 2025-09-03 EP disclosed
EP-3778793-B1 CURABLE COMPOSITION FOR INKJET PRINTING, CURED PRODUCT OF SAME, AND ELECTRONIC COMPONENT HAVING THE CURED PRODUCT TAIYO HOLDINGS CO LTD (JP) 2025-08-27 EP disclosed
CN-120044753-A Photosensitive dry film, photosensitive resin composition, cured film and printed circuit board 杭州福斯特电子材料有限公司 2025-05-27 CN disclosed
US-12313973-B2 Insulating layer for multilayer printed circuit board, multilayer printed circuit board comprising same, and method for producing same LG CHEM, LTD. (KR) 2025-05-27 US disclosed
CN-119859437-A Low-refractive-index photo-curing epoxy ink for display packaging and preparation method and application thereof 万华化学集团电子材料有限公司 2025-04-22 CN disclosed
EP-1775317-A1 POLYORGANOSILOXANE AND CURABLE COMPOSITION CONTAINING SAME TOAGOSEI CO., LTD. (JP) 2007-04-18 EP disclosed
CN-1945434-A Photohardenable and thermosetting resin compositions, their hardened product, and printing circuit boards using the same TAIYO INK MFG CO LTD (JP) 2007-04-11 CN disclosed
EP-1251118-B1 UNSATURATED MONOCARBOXYLIC ESTER COMPOUND, PROCESS FOR PRODUCING THE SAME, AND COMPOSITION CURABLE WITH ACTINIC ENERGY RAY UNIV KANAGAWA (JP) 2006-12-20 EP disclosed
US-7057063-B2 Unsaturated carboxylic ester compound, process for producing the same, and composition curable with actinic energy ray KANAGAWA UNIVERSITY (JP) 2006-06-06 US disclosed
US-20060030636-A1 Unsaturated carboxylic ester compound, process for producing the same, and composition curable with actinic energy ray KANAGAWA UNIVERSITY 2006-02-09 US disclosed
WO-2006004171-A1 PHOTOSENSITIVE FILM, PROCESS FOR PRODUCING THE SAME, PROCESS FOR FORMING PERMANENT PATTERN FUJI PHOTO FILM CO., LTD. (JP) 2006-01-12 WO disclosed
WO-2005093793-A1 PROCESS FOR FORMING PERMANENT PATTERN FUJI PHOTO FILM CO., LTD. (JP) 2005-10-06 WO disclosed
US-20030009053-A1 Unsaturated monocarboxylic ester compound, process for producing the same, and composition curable with actinic energy ray KANAGAWA UNIVERSITY (JP) 2003-01-09 US disclosed
EP-1251118-A1 UNSATURATED MONOCARBOXYLIC ESTER COMPOUND, PROCESS FOR PRODUCING THE SAME, AND COMPOSITION CURABLE WITH ACTINIC ENERGY RAY Kanagawa University (JP) 2002-10-23 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12313973-B2 Insulating layer for multilayer printed circuit board, multilayer printed circuit board comprising same, and method for producing same MMAB, BMI1, EZH2 EPHX1 2808/4885DHFR 4394/4885DCPS 2914/4885
US-20030009053-A1 Unsaturated monocarboxylic ester compound, process for producing the same, and composition curable with actinic energy ray ACSL1, ACSL6, ACSL4 EPHX1 1917/4885DHFR 1959/4885DCPS 3525/4885
US-20060030636-A1 Unsaturated carboxylic ester compound, process for producing the same, and composition curable with actinic energy ray ACSL1, ACSL6, ACSL3 EPHX1 828/4885DHFR 1523/4885DCPS 3963/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.