SCHEMBL3833937

SCHEMBL3833937

COc1cc(CO)c(O)c(OC)c1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PDE4A P27815 1/20 0.48
▸ PDE4B Q07343 1/20 0.48
▸ PDE4C Q08493 1/20 0.48
▸ PDE4D Q08499 1/20 0.48
▸ CALM1 P0DP23 1/20 0.47
▸ ABL1 P00519 1/20 0.47
▸ BCR P11274 1/20 0.47
▸ CYP1A2 P05177 1/20 0.44
▸ ALOX5 P09917 4/20 0.42
▸ USP2 O75604 1/20 0.42
▸ CYP3A4 P08684 1/20 0.42
▸ MAPK1 P28482 1/20 0.42
▸ SMN1; SMN2 Q16637 1/20 0.42
▸ ERN1 O75460 1/20 0.42
▸ PTGS2 P35354 3/20 0.41
▸ TNKS2 Q9H2K2 1/20 0.41
▸ FNTA P49354 1/20 0.40
▸ FNTB P49356 1/20 0.40
▸ MCL1 Q07820 1/20 0.40
▸ HSD17B10 Q99714 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1100031 0.87 ALDH1A1 (0.46) PDE4APDE4BPDE4CPDE4DCALM1
SCHEMBL30679916 0.84 ALOX5 (0.47) PDE4APDE4BPDE4CPDE4DCALM1
SCHEMBL8797591 0.84 ALOX5 (0.47) PDE4APDE4BPDE4CPDE4DCALM1
SCHEMBL205231 0.83 PDE4A (0.52) PDE4APDE4BPDE4CPDE4DCYP1A2
SCHEMBL2002047 0.82 CALM1 (0.46) CALM1ABL1BCRCYP1A2ALOX5
SCHEMBL28274331 0.82 CALM1 (0.46) CALM1ABL1BCRCYP1A2ALOX5
SCHEMBL2002048 0.82 CYP1A2 (0.51) CALM1ABL1BCRCYP1A2ALOX5
SCHEMBL16522399 0.82 ALOX5 (0.61) PDE4APDE4BPDE4CPDE4DALOX5
SCHEMBL1047550 0.80 ABL1 (0.65) ABL1BCRCYP1A2ALOX5USP2
SCHEMBL18362599 0.80 PDE4A (0.48) PDE4APDE4BPDE4CPDE4DCYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230341775-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-26 — — US disclosed
EP-1037649-B1 POLYMERIC PRODRUGS OF AMINO- AND HYDROXYL-CONTAINING BIOACTIVE AGENTS ENZON INC (US) 2009-09-30 — — EP disclosed
EP-1897561-A1 Polymeric prodrugs of amino- and hydroxyl-containing bioactive agents ENZON, INC. (US) 2008-03-12 — — EP disclosed
EP-1037649-A4 POLYMERIC PRODRUGS OF AMINO- AND HYDROXYL-CONTAINING BIOACTIVE AGENTS ENZON INC (US) 2004-11-17 — — EP disclosed
US-6180095-B1 FOR DRUG DELIVERY ENZON, INC. 2001-01-30 — — US disclosed
EP-1037649-A1 POLYMERIC PRODRUGS OF AMINO- AND HYDROXYL-CONTAINING BIOACTIVE AGENTS ENZON, INC. (US) 2000-09-27 — — EP disclosed
WO-1999030727-A9 POLYMERIC PRODRUGS OF AMINO- AND HYDROXYL-CONTAINING BIOACTIVE AGENTS ENZON INC (US) 1999-09-23 — — WO disclosed
WO-1999030727-A1 POLYMERIC PRODRUGS OF AMINO- AND HYDROXYL-CONTAINING BIOACTIVE AGENTS ENZON, INC. (US) 1999-06-24 — — WO disclosed
Send feedback