⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24250830 | 0.79 | — | — | |
| SCHEMBL15277279 | 0.77 | — | — | |
| SCHEMBL29479481 | 0.75 | — | — | |
| SCHEMBL15277289 | 0.74 | — | — | |
| SCHEMBL28857261 | 0.72 | ALDH1A1 (0.39) | — | |
| SCHEMBL8927970 | 0.72 | — | — | |
| SCHEMBL19649 | 0.72 | — | — | |
| SCHEMBL13093806 | 0.70 | — | — | |
| SCHEMBL478395 | 0.70 | — | — | |
| SCHEMBL15277316 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 124 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108929211-B | Device and method for synthesizing vitamin A intermediate tetradecanal | 厦门金达威维生素有限公司 | 2022-03-18 | — | — | CN | disclosed |
| CN-111875500-A | Photosensitive photoresist resin monomer containing polycyclic beta-ketone structure and synthetic method thereof | 徐州博康信息化学品有限公司 | 2020-11-03 | — | — | CN | disclosed |
| CN-111138288-A | Photoresist resin monomer containing five-membered ring β -ketone structure and synthetic method thereof | 上海博栋化学科技有限公司 | 2020-05-12 | — | — | CN | disclosed |
| EP-2482132-B1 | Resist pattern forming process | SHINETSU CHEMICAL CO (JP) | 2019-10-16 | — | — | EP | disclosed |
| EP-2482132-B1 | Resist pattern forming process | SHINETSU CHEMICAL CO (JP) | 2019-10-16 | — | — | EP | disclosed |
| US-9829792-B2 | Monomer, polymer, positive resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-11-28 | — | — | US | disclosed |
| EP-2360527-B1 | Patterning process using EB or EUV lithography | SHINETSU CHEMICAL CO (JP) | 2017-08-23 | — | — | EP | disclosed |
| EP-2360525-B1 | Chemically amplified positive resist composition and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2017-08-23 | — | — | EP | disclosed |
| US-20170008982-A1 | MONOMER, POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-12 | — | — | US | disclosed |
| US-20170008982-A1 | MONOMER, POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-12 | — | — | US | disclosed |
| US-7267923-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-09-11 | — | — | US | disclosed |
| EP-1820797-A1 | SUBSTITUTED PYRIDONE DERIVATIVE | BANYU PHARMACEUTICAL CO., LTD. (JP) | 2007-08-22 | — | — | EP | disclosed |
| US-20070148584-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-06-28 | — | — | US | disclosed |
| US-20070148584-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-06-28 | — | — | US | disclosed |
| US-20070105042-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-10 | — | — | US | disclosed |
| US-20070105042-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-10 | — | — | US | disclosed |
| EP-1783551-A2 | Resist composition and patterning process | Shinetsu Chemical Co., Ltd. (JP) | 2007-05-09 | — | — | EP | disclosed |
| US-20060177763-A1 | Method for producing compound having acid-labile group | KYOWA HAKKO CHEMICAL CO., LTD. (JP) | 2006-08-10 | — | — | US | disclosed |
| EP-1661918-A1 | METHOD FOR PRODUCING COMPOUND HAVING ACID-LABILE GROUP | Kyowa Hakko Chemical Co., Ltd. (JP) | 2006-05-31 | — | — | EP | disclosed |
| US-4334097-A | Process for the preparation of N-α-alkoxyalkyl-carboxamides, and some representatives of this class of compounds and secondary products obtained therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-06-08 | — | — | US | disclosed |