Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | SHBG | P04278 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28222613 | 1.00 | ALDH1A1 (0.40) | ALDH1A1SHBGCYP1A2 | |
| Biphenyl SCHEMBL3842729 | 1.00 | ALDH1A1 (0.40) | ALDH1A1SHBGCYP1A2 | |
| SCHEMBL27987597 | 0.97 | ALDH1A1 (0.42) | ALDH1A1 | |
| SCHEMBL28023311 | 0.95 | ALDH1A1 (0.40) | ALDH1A1 | |
| SCHEMBL28235874 | 0.87 | — | — | |
| Cyclopentane SCHEMBL28673142 | 0.84 | — | — | |
| SCHEMBL1969619 | 0.84 | — | — | |
| SCHEMBL3273950 | 0.81 | ALDH1A1 (0.36) | ALDH1A1SHBGCYP1A2 | |
| SCHEMBL27987599 | 0.78 | ALDH1A1 (0.38) | ALDH1A1CYP1A2 | |
| SCHEMBL15367111 | 0.78 | THRB (0.35) | ALDH1A1SHBG |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2628744-B1 | Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process | SHINETSU CHEMICAL CO (JP) | 2016-11-30 | — | — | EP | claimed |
| EP-4012499-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2022-06-15 | — | — | EP | disclosed |
| EP-2657767-B1 | Patterning process | SHINETSU CHEMICAL CO (JP) | 2018-10-10 | — | — | EP | disclosed |
| CN-108473684-A | The manufacturing method of siloxane polymer | 东丽精细化工株式会社 | 2018-08-31 | — | — | CN | disclosed |
| EP-2826826-B1 | COMPOSITION FOR FORMING A COATING TYPE BPSG FILM, SUBSTRATE FORMED A FILM BY SAID COMPOSITION, AND PATTERNING PROCESS USING SAID COMPOSITION | SHINETSU CHEMICAL CO (JP) | 2018-08-01 | — | — | EP | disclosed |
| US-9971245-B2 | Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-15 | — | — | US | disclosed |
| US-20180081272-A1 | THERMAL CROSSLINKING ACCELERATOR, POLYSILOXANE-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SAME, AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-22 | — | — | US | disclosed |
| EP-2657766-B1 | Patterning process | SHINETSU CHEMICAL CO (JP) | 2018-02-28 | — | — | EP | disclosed |
| US-9902875-B2 | Composition for forming a coating type BPSG film, substrate, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |
| US-9880470-B2 | Composition for forming a coating type silicon-containing film, substrate, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-30 | — | — | US | disclosed |
| EP-2657240-A1 | Silicon compound, silicon-containing compound, composition for forming resits underlayer film containing the same and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-10-30 | — | — | EP | disclosed |
| EP-2657767-A1 | Patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-10-30 | — | — | EP | disclosed |
| EP-2657766-A1 | Patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-10-30 | — | — | EP | disclosed |
| EP-2628744-A1 | Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-08-21 | — | — | EP | disclosed |
| EP-2599819-A1 | Silicon-containing resist underlayer film-forming composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-06-05 | — | — | EP | disclosed |
| EP-2599818-A1 | Silicon-containing resist underlayer film-forming composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-06-05 | — | — | EP | disclosed |
| US-20130137041-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| US-20130137271-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| US-8198016-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-12 | — | — | US | disclosed |
| US-20090286188-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |