Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.67 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.67 |
| ▸ | MEN1 | O00255 | 4/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.51 |
| ▸ | MAPT | P10636 | 3/20 | 0.51 |
| ▸ | POLB | P06746 | 2/20 | 0.51 |
| ▸ | NPC1 | O15118 | 2/20 | 0.51 |
| ▸ | RAB9A | P51151 | 2/20 | 0.51 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.50 |
| ▸ | LMNA | P02545 | 4/20 | 0.48 |
| ▸ | CES2 | O00748 | 1/20 | 0.48 |
| ▸ | CES1 | P23141 | 1/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.47 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.44 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2754357 | 0.86 | ALDH1A1 (0.57) | ALDH1A1CYP3A4MEN1KMT2AMAPT | |
| SCHEMBL2369398 | 0.85 | ALDH1A1 (0.50) | ALDH1A1CYP3A4MEN1KMT2ATDP1 | |
| SCHEMBL4926455 | 0.83 | ALDH1A1 (0.49) | ALDH1A1CYP3A4KMT2ALMNA | |
| SCHEMBL9342917 | 0.83 | ALDH1A1 (0.49) | ALDH1A1CYP3A4KMT2ALMNA | |
| SCHEMBL11273611 | 0.83 | ALDH1A1 (0.48) | ALDH1A1CYP3A4MEN1KMT2AMAPT | |
| SCHEMBL194578 | 0.83 | ALDH1A1 (0.54) | ALDH1A1CYP3A4MEN1KMT2AMAPT | |
| SCHEMBL10712783 | 0.81 | ALDH1A1 (0.51) | ALDH1A1CYP3A4MEN1KMT2AMAPT | |
| SCHEMBL2961457 | 0.81 | ALDH1A1 (0.53) | ALDH1A1CYP3A4MEN1KMT2AMAPT | |
| SCHEMBL159213 | 0.81 | ALDH1A1 (0.69) | ALDH1A1CYP3A4MEN1KMT2AMAPT | |
| SCHEMBL10808346 | 0.80 | ALDH1A1 (0.51) | ALDH1A1CYP3A4MEN1KMT2AMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 455 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0251465-A2 | Light activatable anaerobic composition containing latent sulfonic acid source | LOCTITE CORPORATION (US) | 1988-01-07 | — | — | EP | claimed |
| CN-122072436-A | Negative photosensitive resin composition, cured film, and resist film | DIC株式会社 | 2026-05-22 | — | — | CN | disclosed |
| US-12493244-B2 | Photosensitive resin composition, photosensitive dry film, and pattern formation method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-12-09 | — | — | US | disclosed |
| CN-114600045-B | Photosensitive resin composition, photosensitive dry film and pattern forming method | 信越化学工业株式会社 | 2025-05-09 | — | — | CN | disclosed |
| EP-4050054-B1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD | SHINETSU CHEMICAL CO (JP) | 2025-04-23 | — | — | EP | disclosed |
| WO-2025058368-A1 | PHOTOSENSITIVE RESIN COMPOSITION, INSULATION FILM, AND SEMICONDUCTOR DEVICE | 주식회사 엘지화학 | 2025-03-20 | — | — | WO | disclosed |
| CN-119575759-A | Positive photosensitive resin composition, photosensitive film, resist underlayer film, resist permanent film, and method for producing film | DIC株式会社 | 2025-03-07 | — | — | CN | disclosed |
| US-12197127-B2 | Negative photosensitive resin composition, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-01-14 | — | — | US | disclosed |
| CN-111338181-B | Photosensitive resin composition, photosensitive dry film and pattern forming method | 信越化学工业株式会社 | 2024-11-26 | — | — | CN | disclosed |
| CN-113348188-B | Phenolic hydroxyl group-containing resin, photosensitive composition, resist film, curable composition, and cured product | DIC株式会社 | 2024-05-10 | — | — | CN | disclosed |
| US-4837350-A | Process for the preparation of benzoin sulfonates | CIBA-GEIGY CORPORATION (US) | 1989-06-06 | — | — | US | disclosed |
| EP-0251465-A2 | Light activatable anaerobic composition containing latent sulfonic acid source | LOCTITE CORPORATION (US) | 1988-01-07 | — | — | EP | disclosed |
| EP-0249365-A2 | Photocatalysts for vinyl compounds activated by an electron donating hetero atom | LOCTITE (IRELAND) Ltd. (IE) | 1987-12-16 | — | — | EP | disclosed |
| US-4708926-A | SULFONIC ESTERS OF A-HYDROXYCARBONYL COMPOUNDS | CIBA-GEIGY CORPORATION (US) | 1987-11-24 | — | — | US | disclosed |
| US-4699949-A | Hardening of acid-hardenable compositions containing a blocked hardening catalyst, using heat | CIBA-GEIGY CORPORATION (US) | 1987-10-13 | — | — | US | disclosed |
| EP-0084515-B1 | ACID-CURABLE COMPOSITION CONTAINING A BLOCKED CATALYST, AND A CURING METHOD | CIBA-GEIGY AG (CH) | 1987-04-01 | — | — | EP | disclosed |
| US-4636575-A | Masked curing catalyst for acid-curable compositions | CIBA-GEIGY CORPORATION (US) | 1987-01-13 | — | — | US | disclosed |
| US-4510290-A | LATENCY; LOW-TEMPERATURE CURING BY SHORTWAVE RADIATION; INKS, LACQUERS | CIBA GEIGY CORPORATION (US) | 1985-04-09 | — | — | US | disclosed |
| EP-0084515-A2 | Acid-curable composition containing a blocked catalyst, and a curing method | CIBA-GEIGY AG (CH) | 1983-07-27 | — | — | EP | disclosed |
| US-4344954-A | DIURETICS | AMERICAN CYANAMID COMPANY (US) | 1982-08-17 | — | — | US | disclosed |