Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.53 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.53 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.46 |
| ▸ | MEN1 | O00255 | 3/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.44 |
| ▸ | CES1 | P23141 | 2/20 | 0.44 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | POLB | P06746 | 2/20 | 0.44 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | NPC1 | O15118 | 2/20 | 0.44 |
| ▸ | RAB9A | P51151 | 2/20 | 0.44 |
| ▸ | CES2 | O00748 | 1/20 | 0.44 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.39 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.38 |
| ▸ | CXCR2 | P25025 | 2/20 | 0.37 |
| ▸ | CXCR1 | P25024 | 1/20 | 0.36 |
| ▸ | SRC | P12931 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL384247 | 0.81 | ALDH1A1 (0.67) | ALDH1A1CYP3A4TDP1L3MBTL1MEN1 | |
| SCHEMBL2754357 | 0.81 | ALDH1A1 (0.57) | ALDH1A1CYP3A4TDP1L3MBTL1MEN1 | |
| SCHEMBL9126794 | 0.81 | MAPT (0.52) | ALDH1A1TDP1L3MBTL1MEN1KMT2A | |
| SCHEMBL5133472 | 0.81 | KMT2A (0.51) | ALDH1A1L3MBTL1MEN1KMT2ALMNA | |
| SCHEMBL27518141 | 0.81 | KMT2A (0.51) | ALDH1A1L3MBTL1MEN1KMT2ALMNA | |
| SCHEMBL10712444 | 0.80 | MAPT (0.42) | ALDH1A1CYP3A4TDP1L3MBTL1MEN1 | |
| SCHEMBL12022633 | 0.79 | CXCR2 (0.42) | ALDH1A1CYP3A4TDP1MEN1KMT2A | |
| SCHEMBL194578 | 0.79 | ALDH1A1 (0.54) | ALDH1A1CYP3A4TDP1L3MBTL1MEN1 | |
| SCHEMBL5555255 | 0.77 | CA12 (0.44) | ALDH1A1TDP1L3MBTL1MEN1KMT2A | |
| SCHEMBL5133280 | 0.77 | CA12 (0.44) | ALDH1A1TDP1L3MBTL1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122072436-A | Negative photosensitive resin composition, cured film, and resist film | DIC株式会社 | 2026-05-22 | — | — | CN | disclosed |
| CN-122043858-A | EUV patterned resist formation method | 亚历克斯·P·G·罗宾逊 | 2026-05-15 | — | — | CN | disclosed |
| US-20260118761-A1 | COMPOUND FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, POLYMER, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | Tan Kah Kee Innovation Laboratory (CN) | 2026-04-30 | — | — | US | disclosed |
| CN-120010186-A | Application of spiropyran compound in preparation of photoresist with high exposure tolerance performance | 武汉市太紫微光电科技有限公司 | 2025-05-16 | — | — | CN | disclosed |
| CN-119575759-A | Positive photosensitive resin composition, photosensitive film, resist underlayer film, resist permanent film, and method for producing film | DIC株式会社 | 2025-03-07 | — | — | CN | disclosed |
| CN-113348188-B | Phenolic hydroxyl group-containing resin, photosensitive composition, resist film, curable composition, and cured product | DIC株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-118011733-A | Positive photosensitive resin composition, resist film, resist underlayer film, and resist permanent film | DIC株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-117121184-A | Optical semiconductor device, method for manufacturing the same, solid-state imaging device, and electronic apparatus | 株式会社钟化 | 2023-11-24 | — | — | CN | disclosed |
| CN-117075428-A | Negative photosensitive resin composition | DIC株式会社 | 2023-11-17 | — | — | CN | disclosed |
| CN-117083706-A | Substrate laminate, image sensor, and method for manufacturing substrate laminate | 株式会社钟化 | 2023-11-17 | — | — | CN | disclosed |
| EP-1415974-A1 | PROCESS FOR PRODUCTION OF FLUORINE-CONTAINING NORBORNENE DERIVATIVES | Daikin Industries, Ltd. (JP) | 2004-05-06 | — | — | EP | disclosed |
| US-20030152864-A1 | Novel fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same | DAIKIN INDUSTRIES, LTD. | 2003-08-14 | — | — | US | disclosed |
| EP-1275666-A1 | NOVEL FLUOROPOLYMER HAVING ACID-REACTIVE GROUP AND CHEMICAL AMPLIFICATION TYPE PHOTORESIST COMPOSITION CONTAINING THE SAME | Daikin Industries, Ltd. (JP) | 2003-01-15 | — | — | EP | disclosed |
| EP-0687718-B1 | Curable silicone compositions | SHINETSU CHEMICAL CO (JP) | 2000-12-27 | — | — | EP | disclosed |
| US-6090518-A | HAVING HIGH RESOLUTION, WHICH IS USEFUL FOR A HALFMICRONLITHOGRAPHY EMPLOYING A RADIATION | MITSUBISHI CHEMICAL CORPORATION (JP) | 2000-07-18 | — | — | US | disclosed |
| US-5700899-A | Curable silicone compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-12-23 | — | — | US | disclosed |
| EP-0687718-A1 | Curable silicone compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1995-12-20 | — | — | EP | disclosed |
| US-5449705-A | Silicon-containing polyamic acid derivative and photosensitive resin composition using it | CHISSO CORPORATION (JP) | 1995-09-12 | — | — | US | disclosed |
| US-5442024-A | Polyamic acid having a crosslinkable silane group or copolymerized with a polysiloxane and a compound generating an acid catalyst to effect imidation upon radiating; films; photoresists; shrinkage inhibition; resolution; adhesion | CHISSO CORPORATION (JP) | 1995-08-15 | — | — | US | disclosed |
| US-4699949-A | Hardening of acid-hardenable compositions containing a blocked hardening catalyst, using heat | CIBA-GEIGY CORPORATION (US) | 1987-10-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118761-A1 | COMPOUND FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, POLYMER, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | RAD51, COL2A1, MRPL11 | ALDH1A1 4156/4885CYP3A4 3384/4885TDP1 4095/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.