SCHEMBL3842704

SCHEMBL3842704

Cc1ccc(C=CC(C=Cc2ccc(O)cc2)=Cc2ccc(OC(C)OC3CCCCC3)cc2)cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TRPM8 Q7Z2W7 3/20 0.38
MAPT P10636 3/20 0.36
MAOA P21397 2/20 0.36
MAOB P27338 2/20 0.36
RAB9A P51151 2/20 0.36
POLB P06746 1/20 0.36
MMP1 P03956 1/20 0.34
MMP2 P08253 1/20 0.34
MMP9 P14780 1/20 0.34
CA12 O43570 2/20 0.34
CA1 P00915 2/20 0.34
CA2 P00918 2/20 0.34
CA7 P43166 2/20 0.34
CA9 Q16790 2/20 0.34
CA14 Q9ULX7 2/20 0.34
AKR1B10 O60218 1/20 0.34
AKR1B1 P15121 1/20 0.34
P4HB P07237 1/20 0.32
CALM1 P0DP23 1/20 0.32
MEN1 O00255 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3838221 0.92 TRPM8 (0.37) TRPM8MAPTMMP1MMP2MMP9
SCHEMBL3911036 0.85 PTPN1 (0.34) TRPM8
SCHEMBL6550386 0.83 MAPT (0.43) MAPTMAOAMAOBRAB9APOLB
SCHEMBL3843023 0.83 APP (0.41) TRPM8MAPTRAB9ACA12CA1
SCHEMBL3838358 0.79 CA12 (0.43) MAPTMAOAMAOBRAB9APOLB
SCHEMBL11125523 0.79 KDM4E (0.38) RAB9AMEN1ALDH1A1KMT2AESR1
SCHEMBL15984209 0.79 MEN1 (0.41) MAPTMAOBRAB9AMEN1ALDH1A1
SCHEMBL23907140 0.76 MEN1 (0.42) RAB9AMEN1ALDH1A1KMT2AESR1
SCHEMBL6866016 0.74 CA12 (0.41) MAPTMAOAMAOBRAB9ACA12
SCHEMBL6550339 0.73 PTPN1 (0.37) TRPM8MAPTRAB9ACA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1449833-B1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION WAKO PURE CHEM IND LTD (JP) 2009-09-09 EP disclosed
US-7374857-B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2008-05-20 US disclosed
EP-1449833-A1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2004-08-25 EP disclosed