SCHEMBL23907140

SCHEMBL23907140

CC(Oc1ccc(Oc2ccc(O)cc2)cc1)OC1CCCCC1

nearest known ligand 0.42

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
ESR1 P03372 1/20 0.42
ESR2 Q92731 1/20 0.42
LTA4H P09960 6/20 0.41
NR1H2 P55055 1/20 0.38
BAX Q07812 1/20 0.38
SMN1; SMN2 Q16637 3/20 0.37
NPC1 O15118 1/20 0.37
HPGD P15428 1/20 0.37
RAB9A P51151 1/20 0.37
NPSR1 Q6W5P4 1/20 0.35
KDM4E B2RXH2 1/20 0.35
ALDH1A1 P00352 1/20 0.35
ALOX12 P18054 1/20 0.33
NPY5R Q15761 1/20 0.33
PARP10 Q53GL7 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11125523 0.94 KDM4E (0.38) MEN1KMT2AESR1ESR2LTA4H
SCHEMBL23907136 0.92 KDM4E (0.39) MEN1KMT2ASMN1; SMN2NPC1HPGD
SCHEMBL23907142 0.87 NR1H2 (0.39) MEN1KMT2ANR1H2SMN1; SMN2NPC1
SCHEMBL23907079 0.87 LTA4H (0.40) MEN1KMT2AESR1ESR2LTA4H
SCHEMBL23907073 0.86 HPGD (0.43) MEN1KMT2AESR1ESR2SMN1; SMN2
SCHEMBL3843023 0.85 APP (0.41) MEN1KMT2ASMN1; SMN2NPC1HPGD
SCHEMBL15984209 0.81 MEN1 (0.41) MEN1KMT2ASMN1; SMN2NPC1HPGD
SCHEMBL16429329 0.80 ALDH1A1 (0.38) MEN1KMT2ASMN1; SMN2NPC1HPGD
SCHEMBL6761927 0.80 KMT2A (0.37) MEN1KMT2ASMN1; SMN2NPC1HPGD
SCHEMBL17039860 0.80 NPSR1 (0.47) MEN1KMT2ASMN1; SMN2NPC1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-20210311392-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-10-07 US disclosed