Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.50 |
| ▸ | ATM | Q13315 | 1/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | PBRM1 | Q86U86 | 1/20 | 0.43 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | SRD5A2 | P31213 | 2/20 | 0.41 |
| ▸ | CA12 | O43570 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | CA9 | Q16790 | 1/20 | 0.41 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | CLK1 | P49759 | 1/20 | 0.40 |
| ▸ | DYRK1A | Q13627 | 1/20 | 0.40 |
| ▸ | DYRK1B | Q9Y463 | 1/20 | 0.40 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3839084 | 0.92 | TDP1 (0.52) | L3MBTL1ATMTDP1PBRM1FFAR1 | |
| SCHEMBL1637630 | 0.91 | ATM (0.63) | L3MBTL1ATMTDP1PBRM1ALDH1A1 | |
| SCHEMBL1637032 | 0.88 | ATM (0.46) | L3MBTL1ATMTDP1ALDH1A1SRD5A2 | |
| SCHEMBL739782 | 0.84 | ALDH1A1 (0.61) | L3MBTL1ATMTDP1ALDH1A1SRD5A2 | |
| SCHEMBL3838955 | 0.84 | SRD5A2 (0.48) | ALDH1A1SRD5A2CA12CA1CA2 | |
| SCHEMBL13132758 | 0.82 | L3MBTL1 (0.52) | L3MBTL1ATMTDP1PBRM1FFAR1 | |
| SCHEMBL13132590 | 0.82 | L3MBTL1 (0.52) | L3MBTL1ATMTDP1PBRM1FFAR1 | |
| SCHEMBL22374314 | 0.82 | UNG (0.53) | L3MBTL1ATMTDP1PBRM1FFAR1 | |
| SCHEMBL14908432 | 0.79 | RAB9A (0.60) | L3MBTL1ATMTDP1ALDH1A1SRD5A2 | |
| SCHEMBL3447489 | 0.79 | CA12 (0.40) | L3MBTL1ATMTDP1ALDH1A1CA12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6884862-B2 | Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film | JSR CORPORATION (JP) | 2005-04-26 | — | — | US | claimed |
| US-7556860-B2 | Laminate and method of forming the same, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2009-07-07 | — | — | US | disclosed |
| EP-1245638-B1 | Composition for insulating film formation | JSR CORP (JP) | 2009-01-14 | — | — | EP | disclosed |
| EP-1188807-B1 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORP (JP) | 2007-10-17 | — | — | EP | disclosed |
| EP-1099719-B1 | Diyne-containing (co) polymer, processes for producing the same, and cured film | JSR CORP (JP) | 2007-01-17 | — | — | EP | disclosed |
| EP-1298176-B1 | Stacked film insulating film and substrate for semiconductor | JSR CORP (JP) | 2007-01-03 | — | — | EP | disclosed |
| US-7153767-B2 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORPORATION (JP) | 2006-12-26 | — | — | US | disclosed |
| US-20060216531-A1 | Laminate and method of forming the same, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2006-09-28 | — | — | US | disclosed |
| US-20060210812-A1 | Insulating film and method of forming the same | JSR CORPORATION (JP) | 2006-09-21 | — | — | US | disclosed |
| EP-1696478-A1 | INSULATING FILM, METHOD FOR FORMING SAME AND COMPOSITION FOR FORMING FILM | JSR Corporation (JP) | 2006-08-30 | — | — | EP | disclosed |
| US-20030077461-A1 | Stacked film, insulating film and substrate for semiconductor | JSR CORPORATION (JP) | 2003-04-24 | — | — | US | disclosed |
| EP-1298176-A2 | Stacked film insulating film and substrate for semiconductor | JSR Corporation (JP) | 2003-04-02 | — | — | EP | disclosed |
| US-6528605-B1 | Diyne-containing (co)polymer, processes for producing the same, and cured film | JSR CORPORATION (JP) | 2003-03-04 | — | — | US | disclosed |
| US-20020172652-A1 | Composition for film formation and material for insulating film formation | JSR CORPORATION (JP) | 2002-11-21 | — | — | US | disclosed |
| EP-1254917-A1 | Polymer comprising acetylene repeating units, process for the production, composition for film formation containing the same, method of film formation and insulating film | JSR Corporation (JP) | 2002-11-06 | — | — | EP | disclosed |
| US-20020161173-A1 | Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film | JSR CORPORATION (JP) | 2002-10-31 | — | — | US | disclosed |
| EP-1245638-A1 | Composition for insulating film formation | JSR Corporation (JP) | 2002-10-02 | — | — | EP | disclosed |
| US-20020064953-A1 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORPORATION (JP) | 2002-05-30 | — | — | US | disclosed |
| EP-1188807-A2 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR Corporation (JP) | 2002-03-20 | — | — | EP | disclosed |
| EP-1099719-A1 | Diyne-containing (co) polymer, processes for producing the same, and cured film | JSR Corporation (JP) | 2001-05-16 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020172652-A1 | Composition for film formation and material for insulating film formation | VCL, BMI1, PUF60 | L3MBTL1 2698/4885ATM 1417/4885TDP1 1971/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.