⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2502152 | 0.82 | — | — | |
| SCHEMBL621059 | 0.82 | ALDH1A1 (0.31) | — | |
| SCHEMBL7925570 | 0.79 | — | — | |
| SCHEMBL7936205 | 0.79 | — | — | |
| SCHEMBL2223039 | 0.79 | — | — | |
| SCHEMBL7934363 | 0.79 | — | — | |
| SCHEMBL7934409 | 0.79 | — | — | |
| SCHEMBL17001480 | 0.78 | — | — | |
| SCHEMBL27532668 | 0.78 | ALDH1A1 (0.55) | — | |
| SCHEMBL1740551 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 343 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4083110-B1 | METHOD FOR THE PRODUCTION OF TERMINATED, LIQUID SILOXANES FROM SILICONE WASTE | EVONIK OPERATIONS GMBH (DE) | 2026-02-25 | — | — | EP | claimed |
| CN-119433742-A | Polyacrylonitrile fiber, flame-retardant polyacrylonitrile pre-oxidized fiber and preparation method | 东华大学 | 2025-02-14 | — | — | CN | claimed |
| US-20240279259-A1 | LITHIUM DIFLUORO-BIS(OXALATE)PHOSPHATE, PREPARATION METHOD THEREFOR, AND APPLICATION THEREOF | Shenzhen Yanyi New Materials Co., Ltd. (CN) | 2024-08-22 | — | — | US | claimed |
| US-12060460-B2 | Process for producing endcapped, liquid siloxanes from silicone wastes | EVONIK OPERATIONS GMBH (DE) | 2024-08-13 | — | — | US | claimed |
| CN-118084390-A | Waterproof agent and preparation method thereof | 中化二建集团有限公司 | 2024-05-28 | — | — | CN | claimed |
| EP-3274699-B1 | METHOD FOR TREATING FET SENSOR ARRAYS AND RESULTING SENSOR DEVICES | LIFE TECHNOLOGIES CORP (US) | 2023-12-20 | — | — | EP | claimed |
| CN-113880066-B | Method for preparing lithium difluorophosphate by flow chemistry method | 深圳市研一新材料有限责任公司 | 2023-07-21 | — | — | CN | claimed |
| WO-2022253007-A1 | LITHIUM DIFLUORO-BIS(OXALATE)PHOSPHATE, PREPARATION METHOD THEREFOR, AND APPLICATION THEREOF | 深圳市研一新材料有限责任公司 | 2022-12-08 | — | — | WO | claimed |
| US-20220348721-A1 | PROCESS FOR PRODUCING ENDCAPPED, LIQUID SILOXANES FROM SILICONE WASTES | EVONIK OPERATIONS GMBH (DE) | 2022-11-03 | — | — | US | claimed |
| EP-4083110-A1 | METHOD FOR THE PRODUCTION OF TERMINATED, LIQUID SILOXANES FROM SILICONE WASTE | Evonik Operations GmbH (DE) | 2022-11-02 | — | — | EP | claimed |
| WO-2006135656-A2 | PROCESSES FOR THE PREPARATION OF PACLITAXEL | FLORIDA STATE UNIVERSITY RESEARCH FOUNDATION, INC. (US) | 2006-12-21 | — | — | WO | claimed |
| US-20060244034-A1 | Low-dielectric films, and manufacturion method thereof, and electronic component using it | RORZE CORPORATION (JP) | 2006-11-02 | — | — | US | claimed |
| WO-2006091264-A1 | METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM | TOKYO ELECTRON LIMITED (JP) | 2006-08-31 | — | — | WO | claimed |
| CN-1823406-A | Low dielectric constant film, method for producing the same, and electronic device using the same | RORZE CORP (JP) | 2006-08-23 | — | — | CN | claimed |
| WO-2006062219-A1 | ULTRAVIOLET TRANSMISSIVE POLYHEDRAL SILSESQUIOXANE POLYMERS | MATSUSHITA ELECTRIC WORKS, LTD. (JP) | 2006-06-15 | — | — | WO | claimed |
| US-20040147694-A1 | Method of producing conjugated diene polymers with narrow molecular weight distribution and polymer produced | JSR CORPORATION | 2004-07-29 | — | — | US | claimed |
| EP-0863165-B1 | Method of producing conjugated diene polymers | JSR CORP (JP) | 2003-06-04 | — | — | EP | claimed |
| EP-0863165-A1 | Method of producing conjugated diene polymers | JSR Corporation (JP) | 1998-09-09 | — | — | EP | claimed |
| US-5599387-A | VAPOR FOR PYROLYTIC DEPOSITION OF SILICON DIOXIDE COMPRISING CARRIER GAS, SOURCE OF OXYGEN, SILICON COMPOUND HAVING SIICON-OXYGEN BOND | PPG INDUSTRIES, INC. (US) | 1997-02-04 | — | — | US | claimed |
| US-5521126-A | Method of fabricating semiconductor devices | NEC CORPORATION (JP) | 1996-05-28 | — | — | US | claimed |