Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 6/20 | 0.38 |
| ▸ | CA1 | P00915 | 2/20 | 0.38 |
| ▸ | CA9 | Q16790 | 2/20 | 0.38 |
| ▸ | ALPL | P05186 | 2/20 | 0.37 |
| ▸ | ALPI | P09923 | 1/20 | 0.37 |
| ▸ | CA12 | O43570 | 2/20 | 0.36 |
| ▸ | PPARG | P37231 | 1/20 | 0.36 |
| ▸ | CA5A | P35218 | 2/20 | 0.35 |
| ▸ | F2 | P00734 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | CSNK2A2 | P19784 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6941225 | 0.95 | ALDH1A1 (0.44) | HPGDALDH1A1KDM4EGAACYP3A4 | |
| SCHEMBL8194919 | 0.91 | ALDH1A1 (0.46) | HPGDALDH1A1KDM4EGAACYP3A4 | |
| SCHEMBL927493 | 0.89 | ALDH1A1 (0.45) | HPGDALDH1A1KDM4EGAATSHR | |
| SCHEMBL17355707 | 0.85 | HPGD (0.36) | HPGDALDH1A1KDM4EGAACYP3A4 | |
| SCHEMBL8199185 | 0.85 | ALPL (0.39) | HPGDALDH1A1KDM4EGAACYP3A4 | |
| SCHEMBL15460152 | 0.80 | IDH1 (0.38) | HPGDALDH1A1KDM4EGAACYP3A4 | |
| SCHEMBL9957932 | 0.80 | ALDH1A1 (0.55) | HPGDALDH1A1GAACYP3A4CA2 | |
| SCHEMBL9958096 | 0.80 | ALDH1A1 (0.55) | HPGDALDH1A1GAACYP3A4CA2 | |
| SCHEMBL8225768 | 0.79 | HPGD (0.33) | HPGDALDH1A1KDM4EGAAALPL | |
| SCHEMBL4599461 | 0.78 | PPARG (0.58) | HPGDALDH1A1KDM4EGAATDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2112133-B1 | Halogenated aromatic compound, polymer thereof, and proton-conductive membrane comprising same | JSR CORP (JP) | 2012-07-04 | — | — | EP | disclosed |
| EP-2112133-A1 | Halogenated aromatic compound, polymer thereof, and proton-conductive membrane comprising same | JSR Corporation (JP) | 2009-10-28 | — | — | EP | disclosed |
| EP-1245555-B1 | Halogenated aromatic compound, polymer thereof, and proton-conductive membrane comprising same | JSR CORP (JP) | 2009-08-19 | — | — | EP | disclosed |
| US-7556860-B2 | Laminate and method of forming the same, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2009-07-07 | — | — | US | disclosed |
| EP-1482589-B1 | Manufacturing process of membrane-electrode assemblies | JSR CORP (JP) | 2009-02-18 | — | — | EP | disclosed |
| EP-1245638-B1 | Composition for insulating film formation | JSR CORP (JP) | 2009-01-14 | — | — | EP | disclosed |
| US-7396607-B2 | Manufacturing process for membrane-electrode assemblies | JSR CORPORATION (JP) | 2008-07-08 | — | — | US | disclosed |
| EP-1188807-B1 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORP (JP) | 2007-10-17 | — | — | EP | disclosed |
| EP-1298176-B1 | Stacked film insulating film and substrate for semiconductor | JSR CORP (JP) | 2007-01-03 | — | — | EP | disclosed |
| US-7153767-B2 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORPORATION (JP) | 2006-12-26 | — | — | US | disclosed |
| EP-1245638-A1 | Composition for insulating film formation | JSR Corporation (JP) | 2002-10-02 | — | — | EP | disclosed |
| EP-1245554-A1 | Monomer containing electron-withdrawing group and electron-donative group, and copolymer and proton-conductive membrane comprising same | JSR Corporation (JP) | 2002-10-02 | — | — | EP | disclosed |
| US-20020064953-A1 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORPORATION (JP) | 2002-05-30 | — | — | US | disclosed |
| EP-1188807-A2 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR Corporation (JP) | 2002-03-20 | — | — | EP | disclosed |
| US-20010037000-A1 | Polyarylene copolymers and proton-conductive membrane | JSR CORPORATION (JP) | 2001-11-01 | — | — | US | disclosed |
| EP-0956312-B1 | PROCESS FOR PRODUCING PHENYLENE-CONTAINING POLYMER AND FILM-FORMING MATERIAL | JSR CORP (JP) | 2001-10-10 | — | — | EP | disclosed |
| US-6300465-B1 | Process for producing phenylene-containing polymer and film-forming material | JSR CORPORATION (JP) | 2001-10-09 | — | — | US | disclosed |
| EP-1138712-A2 | Polyarylene copolymers and proton-conductive membrane | JSR Corporation (JP) | 2001-10-04 | — | — | EP | disclosed |
| EP-0956312-A1 | PROCESS FOR PRODUCING PHENYLENE-CONTAINING POLYMER AND FILM-FORMING MATERIAL | JSR Corporation (JP) | 1999-11-17 | — | — | EP | disclosed |
| WO-1998033836-A1 | PROCESS FOR PRODUCING PHENYLENE-CONTAINING POLYMER AND FILM-FORMING MATERIAL | JSR CORPORATION (JP) | 1998-08-06 | — | — | WO | disclosed |