Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 10/20 | 0.56 |
| ▸ | MAPT | P10636 | 8/20 | 0.49 |
| ▸ | NPSR1 | Q6W5P4 | 6/20 | 0.49 |
| ▸ | MPI | P34949 | 5/20 | 0.49 |
| ▸ | XBP1 | P17861 | 4/20 | 0.49 |
| ▸ | HSP90AA1 | P07900 | 4/20 | 0.49 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.47 |
| ▸ | MEN1 | O00255 | 2/20 | 0.47 |
| ▸ | LMNA | P02545 | 4/20 | 0.46 |
| ▸ | RAB9A | P51151 | 4/20 | 0.46 |
| ▸ | S1PR2 | O95136 | 3/20 | 0.46 |
| ▸ | PKM | P14618 | 2/20 | 0.46 |
| ▸ | HTT | P42858 | 2/20 | 0.46 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.46 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 4/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.45 |
| ▸ | TP53 | P04637 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2048589 | 1.00 | ALDH1A1 (0.56) | ALDH1A1MAPTNPSR1MPIXBP1 | |
| SCHEMBL9899200 | 0.90 | ALDH1A1 (0.50) | ALDH1A1MAPTNPSR1MPIXBP1 | |
| SCHEMBL9899199 | 0.90 | ALDH1A1 (0.50) | ALDH1A1MAPTNPSR1MPIXBP1 | |
| SCHEMBL2045893 | 0.88 | ALDH1A1 (0.56) | ALDH1A1MAPTNPSR1MPIXBP1 | |
| SCHEMBL2045896 | 0.88 | ALDH1A1 (0.56) | ALDH1A1MAPTNPSR1MPIXBP1 | |
| SCHEMBL213134 | 0.85 | KMT2A (0.57) | ALDH1A1MAPTNPSR1MPIXBP1 | |
| SCHEMBL9899088 | 0.85 | ALDH1A1 (0.52) | ALDH1A1MAPTNPSR1MPIXBP1 | |
| SCHEMBL9899089 | 0.85 | ALDH1A1 (0.52) | ALDH1A1MAPTNPSR1MPIXBP1 | |
| SCHEMBL212961 | 0.84 | KMT2A (0.56) | ALDH1A1MAPTNPSR1MPIXBP1 | |
| SCHEMBL215250 | 0.84 | KMT2A (0.56) | ALDH1A1MAPTNPSR1MPIXBP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 219 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8338544-B2 | Polymers functionalized with polyoxime compounds and methods for their manufacture | BRIDGESTONE CORPORATION (JP) | 2012-12-25 | — | — | US | claimed |
| US-20110152449-A1 | POLYMERS FUNCTIONALIZED WITH POLYOXIME COMPOUNDS AND METHODS FOR THEIR MANUFACTURE | BRIDGESTONE CORPORATION (JP) | 2011-06-23 | — | — | US | claimed |
| US-20230176479-A1 | NEGATIVE RESIST FILM LAMINATE AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-08 | — | — | US | disclosed |
| US-20230125270-A1 | RADIATION SENSITIVE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| EP-4167028-A1 | NEGATIVE RESIST FILM LAMINATE AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-19 | — | — | EP | disclosed |
| US-11561472-B2 | Radiation sensitive composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-01-24 | — | — | US | disclosed |
| US-11460774-B2 | Photosensitive resin composition, photosensitive dry film, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-10-04 | — | — | US | disclosed |
| US-11256174-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-02-22 | — | — | US | disclosed |
| EP-3671345-B1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2022-02-02 | — | — | EP | disclosed |
| EP-3309614-B1 | RADIATION SENSITIVE COMPOSITION | NISSAN CHEMICAL CORP (JP) | 2021-11-10 | — | — | EP | disclosed |
| WO-2021079679-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD | 信越化学工業株式会社 | 2021-04-29 | — | — | WO | disclosed |
| EP-1505443-A2 | Resist polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-02-09 | — | — | EP | disclosed |
| US-20040167322-A1 | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-08-26 | — | — | US | disclosed |
| US-20040166432-A1 | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-08-26 | — | — | US | disclosed |
| US-6713612-B2 | Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-03-30 | — | — | US | disclosed |
| US-20040033432-A1 | Novel sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-02-19 | — | — | US | disclosed |
| US-20040033440-A1 | Photoacid generators, chemically amplified positive resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-02-19 | — | — | US | disclosed |
| US-6689530-B2 | ULTRAVIOLET LITHOGRAPHY MICROFABRICATION WITH IMPROVED RESOLUTION AND PATTERN PROFILE AFTER DEVELOPMENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-02-10 | — | — | US | disclosed |
| US-20030224298-A1 | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-04 | — | — | US | disclosed |
| US-20030180653-A1 | Novel sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-09-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20040033432-A1 | Novel sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process | POLL, PIM3, VEGFA | ALDH1A1 3337/4885MAPT 3643/4885NPSR1 1414/4885 |
| US-20030224298-A1 | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | VEGFA, DNMT3A, PIM3 | ALDH1A1 3469/4885MAPT 4240/4885NPSR1 2390/4885 |
| US-11561472-B2 | Radiation sensitive composition | RER1, RAD1, RAD51 | ALDH1A1 2201/4885MAPT 3291/4885NPSR1 3021/4885 |
| US-20030180653-A1 | Novel sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process | CACNA1A, KCNA1, POLL | ALDH1A1 893/4885MAPT 4758/4885NPSR1 3007/4885 |
| US-20040167322-A1 | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | POLL, VEGFA, PIM3 | ALDH1A1 2935/4885MAPT 3758/4885NPSR1 2546/4885 |
| US-20230125270-A1 | RADIATION SENSITIVE COMPOSITION | XRCC6, RAD50, XRCC5 | ALDH1A1 1388/4885MAPT 3609/4885NPSR1 3656/4885 |
| US-20040166432-A1 | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | VEGFA, POLL, PIM3 | ALDH1A1 2609/4885MAPT 3581/4885NPSR1 2305/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.