SCHEMBL385215

SCHEMBL385215

[SiH3][SiH2][SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8354132 0.89
SCHEMBL23749599 0.89
SCHEMBL9223839 0.71
SCHEMBL11096382 0.71
SCHEMBL378744 0.61
SCHEMBL2494003 0.61
SCHEMBL317287 0.61
SCHEMBL11554337 0.61
SCHEMBL23752072 0.61
SCHEMBL74391 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 4744 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260150594-A1 COMBINATORIAL PRECURSOR CHEMISTRY FOR LOW TEMPERATURE APPLIED MATERIALS, INC. (US) 2026-05-28 US claimed
CN-121583869-B Negative plate, manufacturing method thereof and battery Jiangsu Ruien New Energy Technology Co.,Ltd. (CN) 2026-05-26 CN claimed
US-12637614-B2 Preparation method of core-shell quantum dot and core-shell quantum dot TCL TECHNOLOGY GROUP CORPORATION (CN) 2026-05-26 US claimed
CN-122073220-A Silicon-carbon composite material, preparation method thereof, battery cell, battery device and electricity utilization device 宁德时代新能源科技股份有限公司 2026-05-22 CN claimed
CN-113921459-B Semiconductor element and method for manufacturing the same 南亚科技股份有限公司 2026-05-15 CN claimed
WO-2026101663-A1 CONTROLLING ARCING WITH SEASON APPLIED MATERIALS, INC. (US) 2026-05-15 WO claimed
CN-115938969-B Film quality detection method of epitaxial layer 江苏天芯微半导体设备有限公司 2026-05-15 CN claimed
CN-122051194-A Silicon-carbon composite material, preparation method and application thereof 合肥国轩高科动力能源有限公司 2026-05-15 CN claimed
CN-112820692-B Method for providing silicon filled gap for semiconductor device ASM IP私人控股有限公司 2026-05-15 CN claimed
CN-122056123-A Method for improving oxide sidewall quality 应用材料公司 2026-05-15 CN claimed
EP-1587698-A2 INTEGRATED PRESSURE AND ACCELERATION MEASUREMENT DEVICE AND A METHOD OF MANUFACTURE THEREOF Melexis NV (BE) 2005-10-26 EP claimed
WO-2004068094-A2 INTEGRATED PRESSURE AND ACCELERATION MEASUREMENT DEVICE AND A METHOD OF MANUFACTURE THEREOF MELEXIS NV (BE) 2004-08-12 WO claimed
US-20040062873-A1 Method for pretreating and/or coating metallic surfaces with a paint-like coating prior to forming and use of substrates coated in this way CHEMETALL GMBH (DE) 2004-04-01 US claimed
US-20040009300-A1 Coating a metal or alloy strip with a corrosion protective layer and then paint a curable film forming polymer layer, promoting adhesion; use in automobiles, aircraft, missiles production CHEMETALL GMBH (DE) 2004-01-15 US claimed
US-20030185990-A1 Method for pretreating and coating metal surfaces prior to forming, with a paint-like coating and use of substrates so coated CHEMETALL GMBH (DE) 2003-10-02 US claimed
EP-0630933-B1 A method of producing a semiconducting material NIPPON OIL CO LTD (JP) 1999-04-14 EP claimed
US-5700400-A Method for producing a semiconducting material NIPPON OIL CO., LTD. (JP) 1997-12-23 US claimed
EP-0551771-B1 Process for producing polysilanes NIPPON OIL CO LTD (JP) 1997-07-30 EP claimed
EP-0630933-A2 A method of producing a semiconducting material NIPPON OIL CO. LTD. (JP) 1994-12-28 EP claimed
EP-0551771-A2 Process for producing polysilanes NIPPON OIL CO. LTD. (JP) 1993-07-21 EP claimed